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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 3836-3838 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A vertical-cavity surface-emitting laser diode with 20 pairs of AlAs/GaAs distributed Bragg reflectors (DBRs) has been grown on a Si substrate using metalorganic chemical vapor deposition. Interfacial roughness and compositional profile of the AlAs/GaAs DBR structure were studied by cross-sectional scanning electron microscopy (SEM), transmission electron microscopy (TEM), and Auger electron spectroscopy. Cross-sectional SEM and TEM observations reveal quasi-periodic zigzag roughness and nonuniformity in the AlAs and GaAs layers. Auger electron spectroscopy reveals compositional transitions at the AlAs/GaAs heterointerfaces. A lower reflectivity of the AlAs/GaAs DBR on the Si substrate is caused by the degraded heterointerfaces. © 1995 American Institute of Physics.
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 1265-1267 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: GaAs metal-semiconductor field-effect transistors (MESFETs) on Si substrates back-coated with SiO2 grown at high temperature by metalorganic chemical vapor deposition have shown good pinch-off and suppressed sidegating. The SiO2 back-coating suppresses Si incorporation into an undoped GaAs layer during growth, and use of such an undoped layer with a low electron concentration beneath the channel layer improves a pinch-off characteristic. Higher growth temperature also improves crystallinity of GaAs layers grown on Si and helps to suppress the sidegating effect of GaAs MESFETs. The maximum transconductance of 160 mS/mm and the K value of 46.8 mA/V2 mm have been obtained for a MESFET with 2.5 μm gate length.
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 57 (1990), S. 2669-2671 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have successfully grown an undoped GaAs layer with a low electron concentration on Si by metalorganic chemical vapor desposition (MOCVD). The back and side edges of the Si substrate were covered with a Si3N4/SiO2 stacked layer to suppress Si incorporation into GaAs by the gas phase transport mechanism during the MOCVD growth. A 3-μm-thick undoped GaAs layer with an electron concentration of 3×1014 cm−3, as low as the electron concentration of a GaAs layer grown on a GaAs substrate, was grown on the Si substrate even at 750 °C.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 5816-5821 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report characteristics and degradation of an InGaN/AlGaN double-heterostructure light-emitting diode (LED) grown by metalorganic chemical vapor deposition on a sapphire substrate. The InGaN/AlGaN LED exhibited an optical output power of 0.17 mW, an external quantum efficiency of 0.2%, a peak emission wavelength at 440 nm with a full width at half-maximum of 63 nm, and a stable operation up to 3000 h under 30 mA dc operation at 30 °C. However, the InGaN/AlGaN LED showed electrical and optical degradations under high injected current density and high ambient temperature. Electroluminescence, electron-beam-induced current and cathodoluminescence observations showed that the degraded InGaN/AlGaN LED exhibited formation and propagation of dark regions, which act as nonradiative recombination centers. The values of the degradation rate were determined to be 1.1×10−3, 1.9×10−3, and 3.9×10−3 h−1 under the injected current density of 100 A/cm2, and 1.6×10−2, 3.6×10−2, and 8×10−2 h−1 under 200 A/cm2 at ambient temperatures of 30, 50, and 80 °C, respectively. The activation energy of degradation was also determined to be 0.23–0.25 eV. The degradation of electrical and optical characteristics was caused by the growth of dark regions. It was also observed that GaN-based LEDs on sapphire substrates have longer lifetime than the ZnSe-based LED, but shorter than the AlGaAs and InGaAsP LEDs. © 1997 American Institute of Physics.
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  • 5
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We demonstrate the first room-temperature low-threshold continuous-wave (cw) operation of Al0.3Ga0.7As/GaAs single quantum well (SQW) heterostructure lasers grown by metalorganic chemical vapor deposition (MOCVD) on Si substrates using techniques of SiO2 back coating and thermal cycle annealing. The all-MOCVD-grown SQW lasers on GaAs/Si with etch pit density of 1.5× 107 cm−2 have threshold current as low as 55 mA (1.41 kA/cm2) under cw at room temperature. The SiO2 back coating is effective to obtain excellent current-voltage characteristics. Thermal cycle annealing is also found to improve the crystallinity of GaAs/Si and to contribute to room-temperature cw operation of the lasers on Si substrates.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 91 (2002), S. 528-530 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report the characteristics of InGaN multiple-quantum-well (MQW) green light-emitting diodes (LEDs) on Si (111) substrates. The MQW LEDs were grown on Si by metalorganic chemical vapor deposition using Al0.27Ga0.73N/AlN intermediate layers. The LED on Si showed an operating voltage of 7 V, a series resistance of 100 Ω, an optical output power of 20 μW, and a peak emission wavelength of 505 nm with a full width at half maximum of 33 nm at 20 mA drive current. The optical output power was half as compared to that of green LED on sapphire. The LED also exhibited a stable operation over 500 h under automatic current control (20 mA) condition at 27 °C. © 2002 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 64 (1994), S. 1401-1403 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A GaAs-based laser diode grown on a Si-substrate suffers from degradation, which results from the deterioration of electrical and optical characteristics. An initial deterioration of a p-n junction is observed in a reverse current-voltage (I-V) characteristic, and becomes ohmic-like under a higher ambient temperature and a larger forward current. Electroluminescence observation shows that the optical deterioration is caused by the growth of dark spot regions, which act as nonradiative recombination regions. The deterioration of the I-V characteristic is probably due to defect-accelerated impurity diffusion because the growth of GaAs/Si involves a high dislocation density, a large tensile stress and a large amount of Si near the GaAs/Si interface.
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 61 (1992), S. 2923-2925 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Scanning tunneling microscope images show that a smoother surface and heterointerface can be obtained in a GaAs/Si grown with Al0.5Ga0.5As/Al0.55Ga0.45P intermediate layers (AlGaAs/AlGaP ILs), which result from a two-dimensional growth at an initial stage. By using the AlGaAs/AlGaP ILs, the device characteristics are improved; a saturation electron velocity of 1.6×107 cm/s for a GaAs metal-semiconductor field-effect transistor, and an internal quantum efficiency of 83%, an intrinsic mode loss coefficient of 23 cm−1, a differential gain coefficient of 1.9 cm/A, and a transparency current of 266 A/cm2 for a single quantum-well laser diode.
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 3605-3607 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have grown Al-free reliable 877 nm In0.49Ga0.51P/GaAs light-emitting diodes (LEDs) on Si substrates by metalorganic chemical vapor deposition. The conventional Al-containing Al0.3Ga0.7As/GaAs LEDs on Si substrates exhibit rapid degradations because of the formation of dark-line defects (DLDs). On the contrary, the In0.49Ga0.51P layer on the GaAs/Si substrate exhibited a 300 K electron mobility of 950 cm2/V s with the carrier concentration of 3.8×1017 cm−3, no residual stress and a lower surface recombination velocity. The In0.49Ga0.51P/GaAs LED on Si shows the stable operation for more than 2000 h, which results from the suppression of the formation of DLDs. © 1995 American Institute of Physics.
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 2995-2997 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have studied the rapid degradation of the AlGaAs/GaAs single quantum well laser diodes on Si substrates grown by metalorganic chemical vapor deposition. The dislocations propagate at velocities up to ∼75 μm/h along 〈100〉 and ∼20 μm/h along 〈110〉, which cause an increase in threshold current and a decrease in differential quantum efficiency. The degraded current–voltage characteristic resulted from the defect-assisted impurity diffusion. The degradation process occurs very rapidly due to the presence of a high density of defects and thermally induced strain. © 1995 American Institute of Physics.
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