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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 3997-4003 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We used the novel experimental technique of photoemission spectromicroscopy to investigate the active area of SnOx thin films for gas sensors, deposited by dc sputtering. First, we analyzed the degree of oxidation and the homogeneity of as-deposited films in a high lateral resolution (30 μm) spectromicroscopy mode with an energy resolution of 0.4 eV. This led to a surprising discovery of a large amount of tin monoxide on the film surface. Then we studied the interaction of H2 and H2O with the surface of polycrystalline SnO2 films used as sensitive layers in actual gas sensor devices. These results have been related to the resistivity changes of the corresponding devices: we found that such changes are primarily due to a reduction process in the film rather than to mere chemisorption.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Direct observation of optical emission from H-related complexes in molecular beam epitaxy grown bulk GaAs and GaAlAs, as well as InGaAs/GaAs strained multiquantum wells (MQWs), is obtained from liquid He photoluminescence experiments. Hydrogenation is achieved by low-energy ion irradiation from a Kaufman source. The volume incorporation of hydrogen, for equal treatment, is dependent upon the density of impurities and defects where H can bind. For moderate H treatment, in addition to passivation of shallow acceptors, in GaAs we observe novel emission bands, δ, peaking at 1.360, and γ, peaking at 1.455 eV. After heavy hydrogen treatment in GaAs of low radiative efficiency−even p type originally−there appears a deeper structure α at ∼1.20 eV, of the kind known for "internal'' transitions in the Ga vacancy-donor complex. Equivalent bands are found in bulk GaAlAs and also in InGaAs/GaAs MQWs. The results allow an approximate estimate of the various optically active Ga-vacancy levels, as affected by the different degrees of hydrogenation of the dangling bonds, and a comparison with theoretical values. Moreover, they provide evidence for the creation of a H-related donor whose binding energy is of order 25 meV. Finally, the γ band is suggestive of a transition between localized conduction and valence states associated with the local distortion that is introduced in the lattice when H binds to impurities, defects, and lattice atoms.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 1473-1477 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We investigate the effect of the ohmic contact conductance on the current distribution in the surface and bulk layers in semiconductor planar devices. In particular we analyze the current-voltage characteristics in the three-probe configurations, where probe one is the injecting contact and probes 2 and 3 are the drains. We find that the current distribution is substantially affected by the contact conductance and the ratio between the shunt currents from probes 1 to 2, and from 1 to 3 is mainly dominated by the contact and surface conductivities in the sample. This ratio is less sensitive to the change of the bulk conductivity. We also show the effect of the geometric parameters of the sample on the current distribution. In addition, the lines of current from probes 1 to 2 are concentrated within a thin surface layer. Therefore, the current through probe 2 is determined by the bulk and surface conductances as well as by the contact conductivity. On the other hand, the current through probe 3 is primarily controlled by bulk and contact conductivity. This makes it possible to simultaneously measure surface and bulk conductances in semiconductors if the contact conductivity is known.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 2048-2050 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We tested the theoretical prediction that the band structures on the opposite sides of a homojunction can be artificially displaced in energy with respect to each other by means of double intralayers of atomiclike thickness, producing band discontinuities of potential interest for practical applications. Evidence of such discontinuities was found when Ga-As, Al-As, Ga-P, or Al-P intralayers were inserted between Si and Si or Ge and Ge.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 4174-4176 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This article concerns a novel negative-conductance device consisting of a series of N laterally indented barriers which exhibits resonant tunneling under one bias polarity and simple tunneling under the opposite one, thus acting as a rectifier. Electrons undergo resonant tunneling when the bias creates a band profile with N triangular wells which can each contain a resonant state. From 1 to N the addition of each indentation can be used to increase the current density and the rectification ratio, calculated at the current-peak bias at resonance, provided that at a given bias all the states in the triangular wells align each other with the emitter Fermi energy in order to form a resonance along the structure. © 1996 American Institute of Physics.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 3820-3823 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report the formation of silicon oxide thin films at room temperature obtained by Ar+ ion bombardment of Si(100) wafers in partial oxygen atmosphere. Samples have been prepared at several ion beam energies (0≤Eb≤400 eV) and characterized by x-ray photoelectron spectroscopy. The oxidation rate, as well as the SiO2/SiOx (x=0.5, x=1, and x=1.5) ratio, have been found to increase with the ion beam energy. For the highest energy bombardment, Eb=400 eV, we observed the formation of a uniform, electrically insulating, SiO2 top layer about 37 A(ring) thick. © 1995 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 3710-3713 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Core-level photoemission peaks taken on several insulators with spatial resolution of 30–300 μm rigidly shift in energy from place to place, most likely because of local charging effects. Such phenomena can affect the linewidth and the general lineshape of conventional, spatially integrated spectra even when a flood gun is used, which is one of the standard remedies against charging. This may require a critical revision of photoemission linewidths and lineshapes for many past experiments on insulators.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 81 (1997), S. 292-296 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report a modification by thin silicon nitride intralayers of the Au/n-GaAs(100) Schottky barrier height. Thin intralayers were obtained by nitridation of evaporated Si films on decapped GaAs substrates in an argon–nitrogen mixture plasma. The nitridation was performed at a beam energy 〈40 eV, with 573 K sample temperature. Gold was deposited to study in situ the Schottky barrier formation process with x-ray photoelectron spectroscopy. Internal photoemission spectroscopy and current–voltage measurements were used to evaluate the barrier modification on fully formed interfaces. Such a modification was analyzed in terms of theoretical calculations of the dipole created by the substrate–intralayer bonds. © 1997 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 7114-7122 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thin silicon dioxide films nitrided in N2O by rapid thermal processing (RTP) or in a classical furnace were investigated by x-ray photoelectron spectroscopy, secondary ion mass spectroscopy, and electrical measurements on metal-oxide-semiconductor capacitors. Differences between the two nitridation processes were observed and explained. In lightly nitrided films, nitrogen occupies two configurations. Nitrogen is bound to three silicon atoms with at least one in the substrate or all three in the oxide. In RTP-nitrided films, both of these species are confined to within 1.5 nm of the Si/SiO2 interface. In furnace-nitrided films, the first species is also located close to the interface whereas the second one fills most of the regrown oxide thickness. In furnace-grown films, which are more heavily nitrided, a third structure due to Si2=N–O is observed throughout the layer. The electrical characteristics are well correlated with the amount of nitrogen at the interface that is bound to Si atoms in the substrate. © 1996 American Institute of Physics.
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 1460-1464 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Using (secondary) photoelectron emission microscopy, we studied the fully formed 80 A(ring) Pt/n–GaP(001) interface with a lateral resolution better than 2 μm. We probed the chemically etched and sulfur passivated GaP(001) surface by ultraviolet and soft x rays. The radiation source was either a deuterium lamp or the radiation from ELETTRA's U12.5 undulator. Due to their escape depth, the photoemitted secondary electrons carry chemical information of buried interfaces. The use of tunable synchrotron radiation enabled us to obtain chemical contrast by digital subtraction of the microimages taken at photon energies above and below each core-level absorption edge. The microimages revealed lateral changes in photoyield efficiency and chemical composition. The results were confirmed by x-ray photoemission spectromicroscopy measurements performed using Al Kα radiation. © 1996 American Institute of Physics.
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