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  • 1
    ISSN: 1520-4804
    Quelle: ACS Legacy Archives
    Thema: Chemie und Pharmazie
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 2
    Digitale Medien
    Digitale Medien
    s.l. : American Chemical Society
    Journal of medicinal chemistry 21 (1978), S. 597-598 
    ISSN: 1520-4804
    Quelle: ACS Legacy Archives
    Thema: Chemie und Pharmazie
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 3
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 3348-3351 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: A simple procedure is reported for extracting the energy of trap levels from the I-V characteristics of insulators at room temperature. It is shown that by plotting ln(JE) vs 1/E it is possible to obtain the trap energy directly from the slope, and an estimate of the trap density from the intercept. Furthermore, it is demonstrated that our simplified, trap-assisted tunneling equation differs from the exact solution by only ∼1%–3% for "typical'' nitridation-induced trap energies (2–3 eV), and for fields above 4 MV/cm. At lower trap energies this error is shown to be manifested only in the extracted trap densities and hence the new model can still be used to obtain the trap depth. For nitrided-oxide capacitors it is shown that this nitridation-induced trap energy is ∼2.2 eV which is in good agreement with the work of others. For transistors fabricated on the same wafers evidence is found for a distribution of shallow (≤1 eV) traps which could be due to damage introduced during the source/drain implant.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 4
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 5711-5715 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Conduction has been studied in ultrathin nitrided oxide, re-oxidized nitrided oxide, and nitrogen-annealed nitrided oxide film capacitors in which the nitridation step was performed by a low-partial-pressure nitridation technique. Results indicate that, as well as some degree of barrier lowering due to the build-up of nitrogen at the injecting interface, a trap-assisted mechanism could be responsible for the enhanced conduction exhibited by the nitrided oxide devices. A simplified closed-form trap-assisted tunneling model is employed that produces a fit to the data with a trap depth of 2.1 eV. The difference between this trap model and a model requiring numerical integration was negligibly small (∼2%).
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 5
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 1078-1080 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We report a new theory for electronic conduction in thin (150 A(ring)) oxynitride films. The present experiment reveals that the electronic conduction mechanism in the oxynitride deviates from that in conventionally grown silicon oxide in the electric field ranging from 6 to 14 MV/cm and suggests that the electronic conduction is governed by three different mechanisms according to the strength of electric field. We suggest that the current conduction is trap-assisted at electric fields lower than 8 MV/cm. Specifically, the conduction is due the tunneling of electrons into the shallow traps in the insulator. In the high-field region ((approximately-greater-than)10 MV/cm), the Fowler–Nordheim (FN) effect becomes dominant and depends on the dielectrics preparation conditions. In the moderate-field region, traps can be filled by both FN current and direct tunneling of electron into the traps which result in a quasi-saturation in the leakage current. The experiment also shows a turnaround behavior in leakage current level, ledge in current-voltage characteristics, and field dependency of the current as the nitridation proceeds. These observations can be readily explained based on the proposed conduction mechanism.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 6
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 6299-6303 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: The threshold voltage (VT) degradation metal-oxide-semiconductor field-effect transistors (MOSFETs) with thermally nitrided oxide or pure oxide as gate dielectric was determined under Fowler–Nordheim (FN) stressing. A typical VT turnaround behavior was observed for both kinds of devices. The VT for nitrided oxide MOSFETs shifts more negatively than that for pure oxide MOSFETs during the initial period of FN stressing whereas the opposite is true for the positive shift after the critical time at turnaround point. The discovery that the shift of substrate current peak exhibits similar turnaround behavior reinforces the above results. In the meantime, the field-effect electron mobility and the maximum transconductance in the channel for nitrided oxide MOSFETs are only slightly degraded by stressing as compared to that for pure oxide MOSFETs. The VT turnaround behavior can be explained as follows: Net trapped charges in the oxide are initially positive (due to hole traps in the oxide) and result in the negative shift of VT. With increasing injection time, trapped electrons in the oxide as well as acceptortype interface states increase. This results in the positive shift in VT. It is revealed that VT degradation in MOSFETs is dominated by the generation of acceptortype interface states rather than electron trapping in the oxide after the critical time.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 7
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 7364-7368 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: By considering the decomposition of water-related bonds at the silicon/oxide interfaces, theoretical expressions for the hot-electron induced interface state generation and threshold-voltage shift are developed. Results demonstrate that the relation between the threshold-voltage shift and the hot-electron fluence needs not follow the power law. The developed expression of the threshold-voltage shift is a function of the initial interface trap density, interface hardness, density of water-related chemical bond, and the capture cross section of interface trap and can be used to explain most of the reported experiments. When the trapping rate and the generation rate are close to each other, a power law dependence of the threshold-voltage shift will be observed in a wide range of injection fluence. However, if the trapping rate is greater than the generation rate or for a sample with large hardness and small initial trap density, a quasi-saturation region is observed because of most of the interface trap being filled and the small amount of generated traps. Saturation of the threshold-voltage shift will occur when most of the water-related bonds are dissociated and the created traps are filled.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 8
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 740-742 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: In this work the effects of nitridation temperature on trap parameters have been studied. Using a high-field technique, no significant change in capture cross section (σ) could be seen with all devices having σ∼10−15 cm2, indicating the traps are neutral. Trap energies, extracted using a novel technique based on a simple trap-assisted tunneling model, were found to be ∼2.7 eV for nitridation temperatures below 1100 °C, falling to ∼2.4 eV above this temperature. Trap densities, also extracted using the same method, followed a similar trend.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 9
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 8353-8358 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: The off-state leakage characteristics of n-channel metal-oxide-semiconductor field-effect transistors with pure oxide, low-partial pressure nitrided (LPN) oxide, re-oxidized LPN, and nitrogen-annealed LPN oxide as the gate insulator, were investigated over the temperature range 300–400 K. In the high-field region (above 7 MV/cm), the gate-induced drain leakage was found to be due to band-to-band tunneling for all samples. Low-field conduction was determined to be due to a gate current which was many orders of magnitude higher than the Fowler–Nordheim current observed in capacitors on the same wafers. A trap-assisted tunneling model was employed, using a trap energy of 0.7 eV determined from the activation data, in order to explain the low-field gate current. The most likely cause of this enhanced conduction is oxide degradation in the gate-to-drain overlap region created during the source/drain implant.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 10
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 5203-5206 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Degradation mechanisms contributing to increased 1/f noise of n-channel metaloxide-semiconductor field-effect transistors (n-MOSFETs) after different hot-carrier stresses are investigated. It is demonstrated that for any hot-carrier stress, the stress-induced enhancement of 1/f noise is mainly attributed to increased carrier-number fluctuation arising from created oxide traps, while enhanced surface-mobility fluctuation associated with electron trapping at preexisting and generated fast interface states and near-interface oxide traps is also responsible under maximum substrate- and gate-current stresses. Besides thermal-oxide n-MOSFETs, nitrided-oxide devices are also used to further support the above analysis. © 1999 American Institute of Physics.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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