ISSN:
0142-2421
Keywords:
hard coatings
;
electrochemistry
;
high temperature
;
oxidation
;
XPS
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
Electrochemical and thermal oxidation of TiZrN hard coatings deposited by the plasma beam sputtering technique are investigated using x-ray photoelectron spectroscopy (XPS). Ternary TiZrN coatings are found to be more susceptible towards oxidation compared to binary TiN and ZrN coatings. Electrochemical oxidation results in the formation of a mixed Ti(N,O)+Zr(N,O) oxynitride layer in the lower potential range (up to 1.1 V), whereas at higher potentials a mixed TiO2+ZrO2 oxide layer is formed. This layer still incorporates a certain amount of nitrogen released during transformation of nitride to oxide. A similar is observed in the case of thermal oxidation at 350-600°C, where the main product is a mixed TiO2+ZrO2 layer. Nitrogen, which should normally be evolved during oxidation, remains incorporated in the growing oxide layer. No tendency towards alternate layer formation, i.e. ZrO2/TiO2, was observed under the experimental conditions investigated. © 1998 John Wiley & Sons, Ltd.
Additional Material:
6 Ill.
Type of Medium:
Electronic Resource
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