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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 133-150 
    ISSN: 1572-8986
    Keywords: Induction plasma ; modeling ; chemical equilibrium ; silicon nitride synthesis
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A mathematical model is presented for the numerical simulation of the flow, temperature, and concentration fields in an rf plasma chemical reactor. The simulation is performed assuming chemical equilibrium. The extent of validity of this assumption is discussed. The system considered is the reaction of SiCl4 and NH3 for the production of Si3N4.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 151-166 
    ISSN: 1572-8986
    Keywords: Induction plasma ; modeling ; chemical kinetics ; dissociation of silicon tetrachloride
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A kinetic model has been developed for the prediction of the concentration gelds in an rf plasma reactor. A sample calculation for a SiCl4/H2 system is then performed. The model considers the mixing processes along with the kinetics of seven reactions involving the decomposition of these reactants. The results obtained are compared to those assuming chemical equilibrium. The predictions indicate that an equilibrium assumption will result in lower predicted temperature fields in the reactor. Furthermore, for the chemical system considered here, while differences exist between the concentration fields obtained by the two models, the differences are not substantial.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 8 (1988), S. 133-144 
    ISSN: 1572-8986
    Keywords: Laser Doppler anemometry ; induction plasma ; particle trajectory
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Laser Doppler anemometry is used for the measurements of the plasma and particle velocity profiles in the coil region of an inductively coupled r.f. plasma. Results are reported for a 50 mm i.d. induction plasma torch operated at atmospheric pressure with argon as the plasma gas. The oscillator frequency is 3 MHz and the plate power is varied between 4.6 and 10.5 kW. Plasma velocity measurements are obtained using a fine carbon powder as a tracer. Measurements are also given for larger silicon particles ( $$\bar d_p = {\text{ }}33{\text{ }}\mu m and \sigma = 13 \mu m$$ ) centrally injected into the discharge under different operating conditions.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 8 (1988), S. 113-132 
    ISSN: 1572-8986
    Keywords: Laser Doppler anemometry ; d.c. plasma jet ; particle trajectory
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A study is presented on the use of laser Doppler anemometry (LDA) techniques for the measurement of the gas and particle velocities under plasma conditions. Experimental data is presented for a d.c. plasma jet in which alumina particles are injected under different operating conditions. The results reveal that the plasma velocity at the exit of the jet is of the order of 200–300 m/s. The intensity of turbulence is as high as 30 to 40% in the free shear layer and the particle velocity distribution is shown to be asymmetric, with particle dispersion in the plane of injection considerably more important than that in the perpendicular direction. The average particle velocity depends on the composition of the plasma gas, the torch current, and power.
    Type of Medium: Electronic Resource
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