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  • lower critical solution temperature (LCST)  (1)
  • nonlinear optical polymers  (1)
  • poling  (1)
  • 1
    Electronic Resource
    Electronic Resource
    Bognor Regis [u.a.] : Wiley-Blackwell
    Journal of Polymer Science Part A: Polymer Chemistry 35 (1997), S. 2827-2833 
    ISSN: 0887-624X
    Keywords: poly(divinylsiloxyethylene glycol) ; PVSE ; polycondensation ; electron-beam resist ; lower critical solution temperature (LCST) ; hydrolytic stability ; oxygen reactive ion etching (O2 RIE) resistance ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: Poly(divinylsiloxyethylene glycol), which consists of alternating oligo(ethylene glycol)s (MW = 300) and divinylsiloxanes were prepared by a polycondensation reaction (Mn = 6500-9300, Mw/Mn = 2.01-2.27). The obtained polymer (PVSE300) showed a lower critical solution temperature (LCST) at 10.5°C, meaning that the polymer was soluble in water below the LCST. The glass transition temperature (Tg) and onset temperature of degradation (Td) of the PVSE300 were -72.5 and +317.5°C, respectively. The hydrolytic stability of the PVSE300 in aqueous media was also examined and it was found that PVSE300 was fairly stable in cold water. The lithographic characteristics of PVSE300 were examined against UV and electron-beam (EB) exposure and it was found that the PVSE300 film showed a negative character when developed by cold water. The photosensitivity parameter, Dg50, which denotes the dose at half remaining film thickness after development, against EB exposure was extremely high (1.0 μC/cm2) when a probe current and an accelerating voltage was 100 pA and 20 kV, respectively. A high durability for O2 reactive ion etching (O2 RIE) was also observed. The characteristics of PVSE300 against photoirradiation were also examined. © 1997 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 35: 2827-2833, 1997
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    New York, NY : Wiley-Blackwell
    Polymers for Advanced Technologies 6 (1995), S. 626-631 
    ISSN: 1042-7147
    Keywords: vinyl ethers ; nonlinear optical polymers ; poling ; photocrosslinking ; temporal stability ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Photocrosslinkable second-order nonlinear optical (NLO) polymers were synthesized from cationic copolymerization of a vinyl ether monomer bearing 4′-nitrobiphenyl-4-oxy group as the NLO chromophore with a vinyl ether monomer bearing cinnamoyl group as the photoreactive moiety. To obtain a suitable poling method involving photocrosslinking, which is capable of inducing a higher and more stable second-order nonlinear coefficient, d33, for NLO polymer films, some poling procedures were investigated. An optimized poling method was as follows. Ultraviolet (UV) irradiation is performed for 90 sec during poling at 50°C for 20 min, followed by poling at 150°C for 20 min. By using this poling method NLO polymer films exhibited a higher and considerably stable d33 value at room temperature, even though they had rather lower glass transition temperatures before photocrosslinking. Some photocrosslinking mechanism for NLO polymers investigated here were considered.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
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