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Effect of RCA cleaning on the surface chemistry of glass and polysilicon films as studied by ToF-SIMS and XPS (1998)

Onyiriuka, E. C. ; Moore, C. B. ; Fehlner, F. P. ; [et al.]

Chichester [u.a.] : Wiley-Blackwell

Surface and Interface Analysis 26 (1998), S. 270-277

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ISSN: 0142-2421

Keywords: RCA clean ; glass ; surface chemistry ; polysilicon ; thin film transistor ; ToF-SIMS ; XPS ; x-ray photoelectron spectroscopy ; Chemistry ; Polymer and Materials Science

Source: Wiley InterScience Backfile Collection 1832-2000

Topics: Physics

Notes: The surface chemistry of an alkaline-earth boroaluminosilicate glass is changed by contact with chemical solutions. The present study shows that RCA cleaning creates a silica-rich surface on the glass. This altered surface can be removed by hydrofluoric acid etching. During the RCA cleaning process, glass components can be transferred to a polysilicon film placed in the same alkaline solution. The acidic solution in turn removes most of the contamination from the polysilicon. © 1998 John Wiley & Sons, Ltd.

Additional Material: 4 Ill.

Type of Medium: Electronic Resource

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