ISSN:
0142-2421
Schlagwort(e):
RCA clean
;
glass
;
surface chemistry
;
polysilicon
;
thin film transistor
;
ToF-SIMS
;
XPS
;
x-ray photoelectron spectroscopy
;
Chemistry
;
Polymer and Materials Science
Quelle:
Wiley InterScience Backfile Collection 1832-2000
Thema:
Physik
Notizen:
The surface chemistry of an alkaline-earth boroaluminosilicate glass is changed by contact with chemical solutions. The present study shows that RCA cleaning creates a silica-rich surface on the glass. This altered surface can be removed by hydrofluoric acid etching. During the RCA cleaning process, glass components can be transferred to a polysilicon film placed in the same alkaline solution. The acidic solution in turn removes most of the contamination from the polysilicon. © 1998 John Wiley & Sons, Ltd.
Zusätzliches Material:
4 Ill.
Materialart:
Digitale Medien
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