ISSN:
1572-9605
Schlagwort(e):
Superconductors
;
thin films
;
thin-film processing
;
thin-film deposition
;
sputtering
;
coevaporation
;
activated reactive evaporation
;
molecular beam epitaxy
;
laser ablation
;
CVD
;
MO-CVD
;
PA-CVD
;
multilayers
;
heterostructures
Quelle:
Springer Online Journal Archives 1860-2000
Thema:
Elektrotechnik, Elektronik, Nachrichtentechnik
,
Physik
Notizen:
Abstract This review of high-T c superconducting thin-film processing focuses on the developments in thin-film deposition technologies since 1987. The common deposition processes are described with reference to their effects on superconductor film performance. A comparative evaluation of the potential of the technologies is also given. The development of multilayers and heterostructures is an important requirement for future device applications and is also described. The latest results of the deposition of novel superconducting materials and deposition on uncommon substrates are discussed. The outlook on some imminent topics of future development in process technologies for high-T c superconducting thin films is discussed.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1007/BF00618500
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