ISSN:
1573-2711
Keywords:
carbon nitride films
;
laser ablation
;
ion‐beam bombardment
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Abstract Carbon nitride thin films with N‐concentration about 41% were synthesized by YAG pulsed laser ablation of graphite under a low-energy (〈50 eV)nitrogen ion-beam bombardment. The results of electron diffraction (ED) and X‐ray photoelectron spectroscopy (XPS) analyses suggested the existence of β‐C3N4 polycrystallite grains in the amorphous carbide matrix of the deposited films. Optical emission spectra of the laser produced graphite plasma using different output wavelengths of a Nd:YAG laser, 355, 532 and 1064 nm were studied. The emission spectra showed that the plasma produced by the 355 and 1064 nm laser ablation contained a high concentration of excited C2 radicals while in the case of 532 nm ablation, a relatively higher concentration of excited atomic carbon radicals was found in the plasma. A post‐treatment of the deposited films using low‐energy (50 eV) nitrogen ion‐beam bombardment was carried out in order to improve the concentration of β‐C3N4 structures in the films.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1023/A:1019177221434
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