ISSN:
1042-7147
Keywords:
Radiation resistance
;
Degradation
;
Polysulfone
;
ESR spectra
;
Protective effect
;
Gaseous products
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
The radiation resistance of a series of aromatic polysulfones comprising alternating units of diphenyl sulfone and various aromatic diols has been investigated by measuring volatile products, soluble fractions and electron spin resonance (ESR) spectra. The yields of radicals at 77 K observed by ESR and of SO2 at 423 K have indicated that biphenol gives enhanced resistance to Y radiation, and tetramethyl bisphenol-A decreased resistance, relative to bisphenol-A, bisphenol-S and hydroquinone. The protective effect of bisphenol was confirmed by lower scission and crosslinking yields determined from the soluble fractions after high doses.
Additional Material:
3 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pat.1991.220020102
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