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  • 1
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    Langmuir Probe and Mass Spectroscopic Measurements in Inductively Coupled CF4 Plasmas (2001)
    In:  Other Sources
    Details
    Publication Date: 2019-07-17
    Description: Abstract Electron and ion energy distribution functions and other plasma parameters such as plasma potential (V(sub p)) , electron temperature (T(sub e)), and electron and ion number densities (n (sub e) and n(sub i)) in low pressure CF4 plasmas have been measured. The experiments were conducted in a GEC cell using an inductively coupled plasma (ICP) device powered by a 13.56 MHz radio-frequency (rf) power source. The measurements were made at 300 W of input rf power at 10, 30 and 50 mTorr gas pressures. Langmuir probe measurements suggest that n(sub e), n(sub i) and V(sub p) remain constant over 60% of the central electrode area, beyond which they decrease. Within the limits of experimental error (+/- 0.25 eV), T(sub e) remains nearly constant over the electrode area. T(sub e) and V(sub p) increase with a decrease in pressure. n(sub e) and n(sub i) are not affected as significantly as T(sub e) or V(sub p) by variation in the gas pressure. The electron energy distribution function (EEDF) measurements indicate a highly non-Maxwellian plasma. CF3+ is the most dominant ion product of the plasma, followed by CF2+ and CF+. The concentrations of CF2+ and CF+ are much larger than that is possible from direct electron impact ionization of the parent gas. The cross-section data suggest that the direct electron impact ionization of fragment neutrals and negative ion production by electron attachment may be responsible for increase of the minor ions.
    Keywords: Plasma Physics
    Type: Plasma Sources Science and Technology; 11; 1; 69-76
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    NASA TECHNICAL REPORTS
  • 2
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    Simulation and Experimental Measurements of Inductively Coupled CF4 and CF4/Ar Plasmas (2000)
    In:  Other Sources
    Details
    Publication Date: 2019-07-17
    Description: The recently developed code SEMS (semiconductor equipment modeling software)is applied to the simulation of CF4 and CF4/Ar inductively coupled plasmas (ICP). This work builds upon the earlier nitrogen, transformer coupled plasma (TCP) SEMS research by demonstrating its accuracy for more complex reactive mixtures, moving closer to the realization of a virtual plasma reactor. Attention is given to the etching of and/or formation of carbonaceous films on the quartz dielectric window and diagnostic aperatures. The simulations are validated through comparisons with experimental measurements using FTIR (Fourier Transform Infrared) and UV absorption spectroscopy for CFx and SiFx neutral radicals, QMS (quadrupole mass spectrometry) for the ions, and Langmuir probe measurements of electron number density and temperature in an ICP GEC reference cell.
    Keywords: Plasma Physics
    Type: 53rd Gaseous Electronics Conference; Oct 24, 2000 - Oct 27, 2000; Houston, TX; United States
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    NASA TECHNICAL REPORTS
  • 3
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    Inductively-Coupled RF Powered O2 Plasma as a Sterilization Source (2001)
    In:  CASI
    Details
    Publication Date: 2019-07-13
    Description: Low-temperature or cold plasmas have been shown to be effective for the sterilization of sensitive medical devices and electronic equipment. Low-temperature plasma sterilization procedures possess certain advantages over other protocols such as ethylene oxide, gamma radiation, and heat due to the use of inexpensive reagents, the insignificant environmental impacts and the low energy requirements. In addition, plasmas may also be more efficacious in the removal of robust microorganisms due to their higher chemical reactivity. Together, these attributes render cold plasma sterilization as ideal for the surface decontamination requirements for NASA Planetary Protection. Hence, the work described in this study involves the construction, characterization, and application of an inductively-coupled, RF powered oxygen (O2) plasma.
    Keywords: Plasma Physics
    Type: 33rd AIAA Plasma Dynamics and Lasers Conference; May 20, 2002 - May 23, 2002; Maui, HI; United States
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    NASA TECHNICAL REPORTS
  • 4
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    Impact of Gas Heating in Inductively Coupled Plasmas (2001)
    In:  CASI
    Details
    Publication Date: 2019-07-10
    Description: Recently it has been recognized that the neutral gas in inductively coupled plasma reactors heats up significantly during processing. The resulting gas density variations across the reactor affect reaction rates, radical densities, plasma characteristics, and uniformity within the reactor. A self-consistent model that couples the plasma generation and transport to the gas flow and heating has been developed and used to study CF4 discharges. A Langmuir probe has been used to measure radial profiles of electron density and temperature. The model predictions agree well with the experimental results. As a result of these comparisons along with the poorer performance of the model without the gas-plasma coupling, the importance of gas heating in plasma processing has been verified.
    Keywords: Plasma Physics
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