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  • NONMETALLIC MATERIALS  (4)
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  • 1
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    Adhesion, friction, and wear of plasma-deposited thin silicon nitride films at temperatures to 700 C (1989)
    In:  Other Sources
    Details
    Publication Date: 2011-08-19
    Description: The adhesion, friction, and wear behavior of silicon nitride films deposited by low- and high-frequency plasmas (30 kHz and 13.56 MHz) at various temperatures to 700 C in vacuum were examined. The results of the investigation indicated that the Si/N ratios were much greater for the films deposited at 13.56 MHz than for those deposited at 30 kHz. Amorphous silicon was present in both low- and high-frequency plasma-deposited silicon nitride films. However, more amorphous silicon occurred in the films deposited at 13.56 MHz than in those deposited at 30 kHz. Temperature significantly influenced adhesion, friction, and wear of the silicon nitride films. Wear occurred in the contact area at high temperature. The wear correlated with the increase in adhesion and friction for the low- and high-frequency plasma-deposited films above 600 and 500 C, respectively. The low- and high-frequency plasma-deposited thin silicon nitride films exhibited a capability for lubrication (low adhesion and friction) in vacuum at temperatures to 500 and 400 C, respectively.
    Keywords: NONMETALLIC MATERIALS
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    NASA TECHNICAL REPORTS
  • 2
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    Plasma-deposited amorphous hydrogenated carbon films and their tribological properties (1989)
    In:  Other Sources
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    Publication Date: 2011-08-19
    Description: Recent work on the properties of diamondlike carbon films and their dependence on preparation conditions are reviewed. The results of the study indicate that plasma deposition enables one to deposit a variety of amorphous hydrogenated carbon (a-C:H) films exhibiting more diamondlike behavior to more graphitic behavior. The plasma-deposited a-C:H can be effectively used as hard, wear-resistant, and protective lubricating films on ceramic materials such as Si(sub 3)N(sub 4) under a variety of environmental conditions such as moist air, dry nitrogen, and vacuum.
    Keywords: NONMETALLIC MATERIALS
    Type: Materials Science Forum (ISSN 0255-5476); 52-53; 645-656
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    NASA TECHNICAL REPORTS
  • 3
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    Adhesion, friction and deformation of ion-beam-deposited boron nitride films (1987)
    In:  Other Sources
    Details
    Publication Date: 2018-12-01
    Description: The tribological properties and mechanical strength of boron nitride films were investigated. The BN films were predominantly amorphous and nonstoichiometric and contained small amounts of oxides and carbides. It was found that the yield pressure at full plasticity, the critical load to fracture, and the shear strength of interfacial adhesive bonds (considered as adhesion) depended on the type of metallic substrate on which the BN was deposited. The harder the substrate, the greater the critical load and the adhesion. The yield pressures of the BN film were 12 GPa for the 440C stainless steel substrate, 4.1 GPa for the 304 stainless steel substrate, and 3.3 GPa for the titanium substrate.
    Keywords: NONMETALLIC MATERIALS
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  • 4
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    Adhesion, friction, and wear of plasma-deposited thin silicon nitride films at temperatures to 700 C (1988)
    In:  CASI
    Details
    Publication Date: 2019-07-27
    Description: The adhesion, friction, and wear behavior of silicon nitride films deposited by low- and high-frequency plasmas (30 kHz and 13.56 MHz) at various temperatures to 700 C in vacuum were examined. The results of the investigation indicated that the Si/N ratios were much greater for the films deposited at 13.56 MHz than for those deposited at 30 kHz. Amorphous silicon was present in both low- and high-frequency plasma-deposited silicon nitride films. However, more amorphous silicon occurred in the films deposited at 13.56 MHz than in those deposited at 30 kHz. Temperature significantly influenced adhesion, friction, and wear of the silicon nitride films. Wear occurred in the contact area at high temperature. The wear correlated with the increase in adhesion and friction for the low- and high-frequency plasma-deposited films above 600 and 500 C, respectively. The low- and high-frequency plasma-deposited thin silicon nitride films exhibited a capability for lubrication (low adhesion and friction) in vacuum at temperatures to 500 and 400 C, respectively.
    Keywords: NONMETALLIC MATERIALS
    Type: NASA-TM-101377 , E-4431 , NAS 1.15:101377 , International Conference on Wear of Materials; 9-13 Apr. 1989. Sponsored by A; Denver, CO; United States
    Format: application/pdf
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