ISSN:
0167-9317
Keywords:
0.1 μm
;
Electron beam lithography
;
HPA (hetero polytungstic acid)
;
Stress
;
X-ray diffraction
;
XPS
;
conductivity
;
direct delineation
;
fine metallic patterns
;
hydrogen reduction
;
inorganic resist
;
tungsten
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
Type of Medium:
Electronic Resource
URL:
http://linkinghub.elsevier.com/retrieve/pii/0167-9317(91)90001-T
Permalink