Electronic Resource
Amsterdam
:
Elsevier
Microelectronic Engineering
14 (1991), S. 259-268
ISSN:
0167-9317
Keywords:
DECR
;
ECR
;
Resist etching
;
dry development
;
organosilicon polymer etching
;
oxygen plasma
;
top-imaging lithography
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
Type of Medium:
Electronic Resource
URL:
http://linkinghub.elsevier.com/retrieve/pii/0167-9317(91)90011-2
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