ISSN:
0167-9317
Keywords:
Bleachable dye
;
Bulk effect
;
Contrast enhancement
;
Depth of focus
;
Dyed resist
;
Exposure dose to clear
;
Flood exposure
;
Highly reflecting substrate
;
Inhibitor concentration
;
Interference
;
Linewidth variation
;
Lithographic process window
;
Lithographic simulation tool
;
Modeling
;
Notches
;
Post-exposure bake
;
Resist profiles
;
Resolution gap
;
Sensitivity
;
Topography
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
Type of Medium:
Electronic Resource
URL:
http://linkinghub.elsevier.com/retrieve/pii/0167-9317(94)90002-7
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