ISSN:
1432-0649
Keywords:
78.65H
;
81.60J
Source:
Springer Online Journal Archives 1860-2000
Topics:
Physics
Notes:
Abstract Poly(tetrafluoroethylene) (PTFE) does not exhibit excimer laser etching behavior at conventional, e.g., single photon absorption, emissions of 193, 248, and 308 nm, due to the lack of polymer/photon interaction. This is not surprising since the electronic transitions available to the PTFE molecule are high energy and thus require short wavelength the radiation However, by incorporating a small quantity of material into the non-absorbing fluoropolymer matrix that interacts strongly with the emitted laser energy, e.g., a dopant, successful ablation, both in terms of etch rate and structuring quality occurs. Specifically, excimer laser ablation of PTFE films containing 5, 10, and 15% polyimide (wt/wt) as a dopant was achieved at 308 nm in a fluence range of 1 to 12 J/cm2. Ablation rates for the materials increased with increasing fluence and, at the polyimide levels investigated, varied inversely with dopant concentration. All compositions exhibited excellent structuring quality.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF00325507
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