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  • 52.50.Jm  (1)
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    ISSN: 1432-0630
    Keywords: 42.80.-f ; 52.50.Jm
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract A subpicosecond KrF laser system (248 nm, 0.5 ps) was used as a light source for ablation of PMMA Mylar and Kapton. The time-dependent reflectivity of the light-induced plasma mirror as measured by 496 nm, 0.5 ps long probe pulses showed an increase of up to 94% with 0.4–1 ps rise time and 10–15 ps fall time. The highdensity plasma mirror shows perfect optical quality, and seems to be a promising light-controlled ultrafast switch for UV and visible light. The spectrum of the UV light reflected from the ablated spot is blue shifted by 0.5 nm and shows 1 nm broadening.
    Type of Medium: Electronic Resource
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