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Formation of negative ions by electron impact on SiF4 and CF4 (1992)

Iga, I. ; Rao, M. V. V. S. ; Srivastava, S. K. ; [et al.]

Springer

The European physical journal 24 (1992), S. 111-115

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ISSN: 1434-6079

Keywords: 34.80.Gs

Source: Springer Online Journal Archives 1860-2000

Topics: Physics

Notes: Abstract First measurements of cross sections for the formation of negative ions by electron attachment to SiF4 and CF4 are reported for an electron impact energy range of 0 to 50 eV. The energies at which the various ions appear and the positions at which the ionization efficiency curves peak have been obtained and compared with previous measurements. Thermochemical data have been used to predict and identify the various channels of dissociation. Cross sections for the production of ion pairs through the process of polar dissociation have also been measured.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/BF01426694

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