ISSN:
0142-2421
Keywords:
Ta
;
diffusion barriers
;
nanocrystalline films
;
amorphous films
;
AFM
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
In this paper the investigation of r.f.-sputter-deposited Ta, Ta-N and Ta-N-O thin films is presented. Using atomic force microscopy in combination with sheet resistance measurements, Auger electron spectroscopy and x-ray diffraction, the thin film properties and microstructure are examined. Two crystalline modifications of Ta (tetragonal β-Ta and bcc α-Ta) are reported. By incorporation of nitrogen and/or oxygen into the Ta films, nanocrystalline and quasi-amorphous structures can be achieved. Finally, the usefulness of the films as diffusion barriers in Cu-based metallization systems is described.© 1997 John Wiley & Sons, Ltd.
Additional Material:
7 Ill.
Type of Medium:
Electronic Resource
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