ISSN:
0049-8246
Keywords:
Chemistry
;
Analytical Chemistry and Spectroscopy
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
The influence of the photons emitted by a 241Am XRF excitation source below 59.6 keV on sample fluorescence production has been analysed. A general method for evaluating the contribution of the various lines from the source in specific equipment configurations is presented. The excitation was performed with 23 elemental targets and the measured experimental intensities were fitted by means of a minimization program which takes into account the most important transition groups observed in the spectrum of the excitation source. The program allows for attenuation of excitation and fluoresced photons in the target. Intensity data for the exciting beam were compared with the theoretical intensities of photons from 237Np, and it was concluded that these values are compatible with the Am and Al thicknesses of the excitation source. Correction factors considering low-energy transitions were calculated for several elements for both thick and thin targets. The over-excitation evaluated for Z = 34 reached values ranging between 180% and 550%.
Additional Material:
1 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/xrs.1300160310
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