Publication Date:
2016-08-04
Description:
Article There is a limited range of structures available in nanolithography using directed self-assembled block copolymers. Here, Black and co-workers expand directed self-assembly chemical patterning by using a blend of lamellar and cylinder forming block copolymers on surface chemical line gratings. Nature Communications doi: 10.1038/ncomms12366 Authors: A. Stein, G. Wright, K. G. Yager, G. S. Doerk, C. T. Black
Electronic ISSN:
2041-1723
Topics:
Biology
,
Chemistry and Pharmacology
,
Natural Sciences in General
,
Physics
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