ISSN:
1433-0768
Schlagwort(e):
Key words NiF2 layer
;
Nickel dissolution
;
Monovalent fluorides
Quelle:
Springer Online Journal Archives 1860-2000
Thema:
Chemie und Pharmazie
Notizen:
Abstract The stability of electrochemically formed NiF2 film in 1.0 M perchloric acid containing monovalent fluorides namely, NH4F, HF, NaF, KF and LiF, is investigated using cyclic voltammetry, chronoamperometry, atomic absorption spectroscopy and scanning electron microscopy. In addition to direct dissolution of nickel and dissolution through the oxide layer, a new mode of dissolution of NiF2 film as NiF3 − and NiF4 2− through complex formation is proposed. This process is significantly influenced by the alkali metal fluorides. On a comparative basis the stability of NiF2 decreases in the order NH4F 〉 HF 〉 KF 〉 LiF.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1007/s100080050153
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