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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 2644-2649 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Solid-phase epitaxial growth was studied in germanium-implanted 〈100〉 silicon wafers as a function of germanium fluence, annealing temperature, and time. MeV He Rutherford backscattering in channeling conditions, cross-sectional transmission electron microscopy, double-crystal x-ray diffraction, and secondary-ion mass spectroscopy techniques were used to characterize the samples. At low fluences, up to 1×1015 cm−2 at 130 keV, the crystallization kinetics is similar to that measured on self-amorphized silicon. In the high-dose samples, prepared by multiple implants with a total dose of 3.12×1016 cm−2, the growth rate at fixed temperatures decreases. A comparison with literature data, obtained by similar experiments performed on amorphized uniform GexSi100−x films prepared by molecular-beam epitaxy or chemical-vapor deposition, reveals that the concentration gradient, unavoidable in implanted samples mainly at the end of the ion range region, is strictly connected with the observed decrease.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 2359-2369 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: B-Si and Ge-Si thin-film solid solutions on silicon at different compositions are analyzed by multiple-crystal x-ray diffraction. Computer simulations of the rocking curves are made with a diffraction model which, for dilute alloys, does not differ from that commonly reported in the literature. For sufficiently high solute atomic fractions, modifications are introduced to the Fourier coefficients of the crystal polarizability and to the parameters depending on the lattice strain. In the B-Si case, the comparison between strain and carrier profiles resulting from the simulations and electrical measurements, respectively, gives information on the fraction of substitutional B, the presence of precipitates, and their coherent or incoherent nature. In the Ge-Si case, the solute fraction, its depth gradient, and the static atomic disorder in the alloy are determined by means of the modified diffraction model. In particular, the determination of the atomic displacements around the lattice points in fully strained thin-film Ge-Si alloys give results larger than those evaluated by Monte Carlo calculations for relaxed solid solutions.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 4715-4718 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Measurements performed by x-ray diffraction techniques on silicon wafers implanted with silicon ions show that surface amorphous film and underlying interstitial defects are able to induce wafer convexity. The simulation of the rocking curves obtained by double-crystal diffraction before and after annealing, the measurement of the total vertical expansion of the implanted layer, the determination of the curvature radius, and the use of a theoretical model, directly compatible with the output of rocking curve simulation, recently developed for multilayered crystalline structures, allow us to determine the tangential stress depth distribution of the implanted wafer and the average relaxed volume expansion of the amorphous layer. The results obtained show that both stress and volume expansion increase with dose for a given ion-beam energy. A comparison is made with similar data reported recently in the literature for high-dose arsenic-implanted silicon.
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  • 4
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Laser-annealed and further thermally annealed arsenic implanted silicon specimens have been investigated in a range of doses from 1×1016 to 5×1016 As/cm2, with different experimental techniques: electrical measurements, transmission electron microscopy (TEM), double-crystal x-ray diffractometry (DCD), and extended x-ray absorption fine structure analysis (EXAFS). On the as laser-annealed samples, in the whole range of doses examined, a lattice contraction of the doped layer has been evidenced by DCD, whereas, on the same specimens, EXAFS measurements have shown the presence of a local expansion around substitutional As atoms. The relationship between strain and carrier concentration has been found to be approximately linear and can be described by the presence of a size and an electronic effect, as recently proposed in the literature. The former effect represents the atomic size contribution, while the latter is the strain induced by the variation of the conduction-band minima due to the doping. After a subsequent thermal annealing in a low-temperature range (350–550 °C), a strong deactivation of the dopant has been evidenced by electrical measurements. From the experimental results, a new model of the first step of the As deactivation phenomenon at low temperature is proposed. It is described by the capture of two electrons from a pair of As atoms in the second neighbor position in the Si lattice, leading to the formation of a positively charged arsenic-vacancy cluster (As2V)+, and to the emission of a negatively charged Si self-interstitial I−. This model takes into account the main phenomena that are experimentally observed simultaneously to the As deactivation, i.e., the transition from a contraction to a dilatation of the strain observed by DCD and the formation of interstitial loops. At relatively high temperatures (650–900 °C), the hypothesis of the coexistence of the clusters and of the observed precipitates has to be taken into account in order to explain the nature of the inactive As. However, whether clustering or precipitation is the dominant phenomenon still remains an open question.
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