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  • 11
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 1262-1264 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Two mechanisms controlling residual carbon acceptor incorporation in GaAs grown by atmospheric pressure metalorganic chemical vapor deposition have been identified: (1) the removal of the first methyl group from trimethylgallium in the gas phase, and (2) the removal of the first hydrogen atom from AsH3 adsorbed on the substrate surface. An analysis of the chemical reactions involved shows that the likely source of the residual carbon acceptor is the surface adsorbed trimethylgallium molecule rather than other carbon species in the reactor.
    Type of Medium: Electronic Resource
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  • 12
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 51 (1987), S. 937-939 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The magnetophotoluminescence peaks in the "two-electron'' satellites of the donor bound exciton transitions corresponding to the shallow donors S, Si, Ge, Sn, and Te have been identified by correlation of photoluminescence measurements with photothermal ionization measurements on the same high-purity epitaxial GaAs samples. The magnetophotoluminescence measurements were made at 1.7 K and a magnetic field of 9.0 T. These results permit the use of magnetophotoluminescence measurements for the identification of residual donor impurity species in high-purity GaAs.
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  • 13
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 63 (1988), S. 743-748 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The incorporation of Si in high-purity lightly Si-doped GaAs grown simultaneously on (100), (311)A, and (311)B GaAs substrates by molecular-beam epitaxy has been studied. Photothermal ionization spectroscopy shows that Si is incorporated predominantly as a donor for growth on (100) and (311)B substrates, whereas low-temperature photoluminescence shows that Si is incorporated predominantly as an acceptor for growth on a (311)A substrate. Spectroscopic and Hall-effect measurements show that the dominance of Si donors in the samples grown on the (100) and (311)B substrates renders these samples n-type while the dominance of Si acceptors in the sample grown on the (311)A substrate renders that sample p-type.
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  • 14
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 4685-4702 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: High-purity, lightly Si-doped (μ77∼70 000–126 000 cm2/V s and n77∼2–8×1014 cm−3) molecular beam epitaxy (MBE) GaAs layers have been characterized using variable-temperature Hall effect and C-V measurements, photothermal ionization spectroscopy, low-temperature photoluminescence (PL), and deep level transient spectroscopy (DLTS). The spectroscopic measurements of the residual donors and acceptors indicate that the pronounced increase in carrier concentration which is observed with increasing As flux (for a constant Ga flux) results from incorporation of additional residual S donors from the As source material, and not from reductions in the Si acceptor concentration or residual C acceptor concentration. The increase in carrier concentration with As flux is considerably more pronounced when using an alternative source of As, which introduces both S and 3 additional donor species. The C acceptor concentration increases with As flux using either As source, although the increase is much stronger with the alternative source. The dependence of C concentration on the As source implies that the As source itself contributes at least part of the C background. The Si acceptor concentration is negligible for the range of growth conditions that were used. Close compensation between the residual S donors and C acceptors may account for the high resistivity previously observed in undoped samples grown in this system using the purer As source. The PL data exhibit very weak "defect''-related emissions in the 1.504–1.512 and 1.466–1.482 eV ranges; evidence is presented supporting the existence of a correlation between these two sets of peaks, in agreement with the work of Briones and Collins.Temperature and excitation intensity-dependent PL measurements are used to demonstrate conclusively that the peaks in the 1.466–1.482 eV range are donor-to-acceptor and band-to-acceptor in nature, involving normal shallow donors and at least four different acceptor levels whose exact origin is unknown. The "defect'' peak intensity is larger in the less pure material which contains more C, implying that the "defects'' may be C related. Several electron traps including M1, M3, and M4 are observed in the DLTS spectra, and the C-V measurements give a total trap concentration of ∼3×1013 cm−3.
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  • 15
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    Journal of Mathematical Physics 37 (1996), S. 2376-2387 
    ISSN: 1089-7658
    Source: AIP Digital Archive
    Topics: Mathematics , Physics
    Notes: The unitary irreducible representations of the central extension of the Poincaré group in 1+1 dimensions are constructed by an application of the Kirillov theory. These are then lifted to projective unitary irreducible representations of the Poincaré group. The 1+1 Galilean group is treated separately in an appendix. © 1996 American Institute of Physics.
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  • 16
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    Journal of Mathematical Physics 36 (1995), S. 875-890 
    ISSN: 1089-7658
    Source: AIP Digital Archive
    Topics: Mathematics , Physics
    Notes: Using the Mackey theory of induced representations, the unitary irreducible representations of the proper Galilean group in 2+1 space–time dimensions are constructed. All representations, both true as well as the projective ones, are found. The concomitant representations of the Lie algebra are given. © 1995 American Institute of Physics.
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  • 17
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A real time spectroscopic ellipsometry (RTSE) study of the GaAs/AlGaAs/GaAs heterostructure, performed during Ar ion beam etching, provides the instantaneous GaAs and AlGaAs layer thicknesses and etch rates, the Al composition for the alloy layer, the evolution of the thickness and composition of the surface damage layer, and the near-surface temperature. In addition, combined effects of ion-induced atomic intermixing and etching inhomogeneity can be assessed as the interfaces are crossed. These results demonstrate the extensive capabilities of the RTSE technique for monitoring semiconductor structures during processing.
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  • 18
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The incorporation of residual shallow impurity species, in particular Si, in both chloride and hydride vapor-phase epitaxial GaAs layers grown with oxygen intentionally injected into the source zone has been studied. Photothermal ionization spectroscopy and photoluminescence show that both the Si donor and acceptor concentrations are significantly reduced by the oxygen. The observed reduction of carrier concentration and the increase in Hall mobility with increasing oxygen partial pressure are mainly due to the reduction of Si impurity concentration. Although oxygen can form deep levels as indicated by the 1.4889-eV bound-exciton line in photoluminescence, the main effect of oxygen injection is to improve the material purity by suppression of the incorporation of residual Si.
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  • 19
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 67 (1990), S. 255-259 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The incorporation of Ge in GaAs layers grown simultaneously on (100), (311)A, and (311)B GaAs substrates by molecular-beam epitaxy has been studied using Hall-effect measurements, photothermal ionization spectroscopy, and photoluminescence. The quantitative analysis shows that Ge is more amphoteric than Si, but the orientation dependence of the amphoteric behavior of Ge is similar to Si. The amphoteric site preference of Ge is more selective for growth on the (311) polar orientation than on the (100) nonpolar orientation. Like Si, Ge incorporates predominantly as a donor in (311)B growth, while it incorporates predominantly as an acceptor in (311)A growth.
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  • 20
    Publication Date: 2015-04-02
    Description: We studied localized surface plasmon resonances (LSPR) at different compositions, substrate temperatures, and mass thicknesses of Ag-Au alloy nanoparticle films grown by sequential pulsed laser deposition. The LSPRs were pronounced at all compositions of the films grown at high substrate temperature of about 300 °C as compared to those grown at room temperature. The alloy formation and composition of the films were determined using X-ray photoelectron and energy dispersive spectroscopy. Films' mass thickness and compositional uniformity along the thickness were determined using X-ray reflectometry and secondary ion mass spectroscopy. Atomic force microscopic analysis revealed the formation of densely packed nanoparticles of increasing size with the number of laser ablation pulses. The LSPR wavelength red shifted with increasing either Au percentage or film mass thickness and corresponding LSPR tuning was obtained in the range of 450 to 690 nm. The alloy dielectric functions obtained from three different models were compared and the optical responses of the nanoparticle films were calculated from modified Yamaguchi effective medium theory. The tuning of LSPR was found to be due to combined effect of change in intrinsic and extrinsic parameters mainly the composition, morphology, particle-particle, and particle-substrate interactions.
    Print ISSN: 0021-8979
    Electronic ISSN: 1089-7550
    Topics: Physics
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