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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 84 (1998), S. 3630-3635 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The growth of pinhole-free epitaxial DySi2−x films on atomically clean Si(111) has been achieved by depositing a 2-nm-thick Dy layer onto Si(111) with a 1.5-nm-thick capping amorphous Si (a-Si) layer at room temperature followed by annealing at 700 °C in ultrahigh vacuum. The thickness of the a-Si was selected to be such that the consumption of Si atoms from the substrate is minimized by taking into account the formation of an amorphous interlayer at the Dy/Si(111) interface. Based on our experimental findings, a new mechanism for the formation of pinhole is proposed. The Stranski–Krastanov growth behavior of epitaxial DySi2−x on Si(111) by solid phase epitaxy leads to the apparently random formation of a high density of recessed regions at the initial stage of silicidation. Polycrystalline DySi2−x was found to be present at the areas inside and epitaxial DySi2−x outside the recessed regions. Large numbers of Si atoms from the substrate can therefore diffuse through the recessed regions. As a result, the depth and size of the recessed regions increase with annealing time. Finally, the DySi2−x thin layer inside the recessed regions with higher interface energy is thermally unstable and breaks apart to form pinholes. © 1998 American Institute of Physics.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 7424-7426 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report on the room temperature optical characterization of single crystal hexagonal GaN films on (0001) sapphire grown by metalorganic chemical vapor deposition. The energy gap of GaN was determined to be 3.400 eV by photoreflectance and the possible origin of the photoreflectance signal is discussed. Photocurrent measurement exhibited a peak at 3.351 eV and a continued photoresponse through the ultraviolet region. We found that the intensity of photocurrent was dependent upon the chopper frequency in the measurement. Absorption coefficient and film thickness were obtained from the optical transmission spectra. © 1995 American Institute of Physics.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 5736-5738 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have studied the deep levels in the lattice-matched InP/(InAlGa)As heterojunction system. Five p-n junction samples were grown by metalorganic chemical vapor deposition with varied Al composition of 0%, 16%, 36%, 45%, and 55%. A vacancy-related deep electron trap was found at the InP/(InAlGa)As interface. This trap has less concentration in the sample with higher Al composition, and is not observed when Al composition is greater than 55%. Its activation energy within the band gap increases with the increasing Al composition. The trap can be eliminated by rapid thermal annealing at 700 °C. Current-voltage characteristics show that this trap acts as recombination centers under forward bias condition. © 1995 American Institute of Physics.
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 2282-2284 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have studied the effects of metalorganic chemical vapor deposition (MOCVD) growth conditions on the properties of GaAs solar cells grown upon Ge substrates, and in particular the GaAs/Ge interface. The interface properties were found to strongly depend on growth conditions. By small changes in the growth temperature, the GaAs/Ge interface was altered from active to passive. Only a narrow temperature window (600–630 °C) for the initial GaAs layer growth gave the passive-Ge junction together with good surface morphology. Accordingly, a high efficiency (19%, AM0) GaAs solar cell was grown by atmospheric pressure MOCVD on a Ge substrate without any junction in the Ge.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 84 (1998), S. 6083-6087 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The growth kinetics of amorphous interlayer (a-interlayer) formed by solid-state diffusion in ultrahigh vacuum deposited polycrystalline Gd thin films on (001)Si have been investigated by cross-sectional transmission electron microscopy. The growth of the a-interlayer was found to follow a linear growth law initially. The growth then slows down and deviates from a linear growth law. The result clearly indicated that the growth at early stage is consistent with an interface-reaction-controlled growth model rather than diffusion limited. The activation energy of the linear growth and maximum thickness of the a-interlayer were measured to be about 0.37 eV and 6.6 nm, respectively. Following the growth of amorphous interlayer, epitaxial hexagonal GdSi2−x was found to form at the a-interlayer/(001)Si interface at 225 °C. The relatively small lattice mismatch between GdSi2−x and (001)Si compared to other RESi2−x (RE=rare-earth metal) and (001)Si systems facilitates the epitaxial growth of GdSi2−x on (001)Si, which in turn hampers the further growth of a-interlayer. © 1998 American Institute of Physics.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 1350-1354 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The near-infrared photoluminescence (PL) of Se and Si DX centers in (AlxGa1−x)0.5In0.5P grown by metalorganic vapor phase epitaxy has been demonstrated. Two luminescence peaks with energies of 1.16 and 0.96 eV were observed. The peak positions in PL spectrum were not shifted with various Al compositions (x) in (AlxGa1−x)0.5In0.5P (x〈0.5). This phenomenon is similar to that found for the thermal activation energy of Se related traps (Ec−Et=0.28 eV determined by deep level transient spectroscopy measurements) and Si related traps (Ec−Et=0.4 eV) which also do not change with different Al compositions in AlGaInP. The intensity of these peaks increased with increasing net carrier concentration. In addition, the luminescence energies of these peaks are almost identical with those observed in AlxGa1−xAs (x from 0.07 to 0.4) doped with Se and Si. This observation contradicts the large lattice relaxation model, which predicts that the energy of these two luminescence peaks should change with various host materials due to different energy band structures. On the other hand, interpreted by the small lattice relaxation model, the 1.16 and 0.96 eV luminescence bands can be attributed to an internal transition between the excited DX state and its ground state of Se and Si DX centers, respectively. The luminescence energy is dependent on impurities themselves rather than the host materials, such as AlGaAs or AlGaInP. © 1997 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 749-751 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have grown and characterized heteroepitaxial films of InP on GaAs. We demonstrate that by using flow-rate modulation epitaxy to grow the interface layer in a two-step process, we can improve the quality of heteroepitaxy films. The full widths at half maximum of the x-ray rocking curve and the 10 K photoluminescence spectrum for a 6.2-μm-thick InP/GaAs are 144 arcsec and 1.28 meV, respectively.
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 1774-1776 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have characterized, using the interference structure in x-ray rocking curves, a single or double strained GaInP layer grown on an InP substrate. The measured GaInP layer thicknesses are 9±3 A(ring) and 107±3 A(ring) for the single strained layer samples and 7 A(ring)/50 A(ring) and 32 A(ring)/32 A(ring) for the double strained layer samples. The rocking curve results for the 107 A(ring) single-barrier sample and the 7 A(ring)/50 A(ring) double-barrier sample agreed well with the cross-section transmission electron microscopy data and the secondary-ion mass spectrometry data. The x-ray interference structure for the single strained barrier samples indicates the existence of many half-monolayer steps within the 1×1 mm2 x-ray beam spot at each GaInP/InP interface.
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 773-775 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report the low-temperature metalorganic chemical vapor deposition of InSb on (001)CdTe. This low-temperature process was carried out by a precracking technique. Epitaxial growth with a substrate temperature as low as 185 °C can be obtained using a simple two-stage heater. The deposited films were examined by double-crystal x-ray diffraction, scanning electron microscope, and energy dispersive analysis of x ray. The films grown at 240 °C are stoichiometric, single crystal, and of specular surface morphology.
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 7653-7657 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The dominant diffusing species in the formation of amorphous interlayer between Gd and Si thin films have been determined by a Mo cluster marker experiment. Multilayered metal thin films were deposited on (001) Si in an ultrahigh vacuum electron beam evaporator. The positions of the Mo cluster markers relative to the Si substrate, before and after heat treatment, were determined by transmission electron microscopy and energy dispersive x-ray as well as autocorrelation function analysis. The displacement of the Mo cluster markers in the amorphous interlayer during the Gd–Si interdiffusion indicates that Si atoms constitute the dominant diffusing species during the growth of the amorphous interlayer. © 1998 American Institute of Physics.
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