Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
73 (1993), S. 7385-7388
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have investigated oxygen on CdTe substrates by means of x-ray photoelectron spectroscopy (XPS) and reflection high-energy electron diffraction (RHEED). A Te oxide layer that was at least 15 A(ring) thick was found on the surface of as-delivered CdTe substrates that were mechanically polished. This oxide is not easily evaporated at temperatures lower than 350 °C. Furthermore, heating in air, which further oxidizes the CdTe layer, should be avoided. Etching with HCl acid (15% HCl) for at least 20 s and then rinsing with de-ionized water reduces the Te oxide layer on the surface down to 4% of a monoatomic layer. However, according to XPS measurements of the O 1s peak, 20%–30% of a monoatomic layer of oxygen remains on the surface, which can be eliminated by heating at temperatures ranging between 300 and 340 °C. The RHEED patterns for a molecular beam epitaxially (MBE)-grown CdTe film on a (100) CdTe substrate with approximately one monoatomic layer of oxidized Te on the surface lose the characteristics of the normal RHEED patterns for a MBE-grown CdTe film on an oxygen-free CdTe substrate.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.354096
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