Electronic Resource
College Park, Md.
:
American Institute of Physics (AIP)
The Journal of Chemical Physics
96 (1992), S. 4429-4439
ISSN:
1089-7690
Source:
AIP Digital Archive
Topics:
Physics
,
Chemistry and Pharmacology
Notes:
The thermal (300 K) reaction of SiD+2 with SiD4 proceeds at greater than the Langevin collision rate (21±3×10−10 cm3/molecule s ). The reaction products SiD+3, Si2D+2, and Si2D+4 are produced in a 54:7:39 ratio. Both silicon isotope exchange and adduct (Si2D+6) formation are 〈1% of the collision rate at silane pressures of 1–4×10−7 Torr. The branching ratio for SiD+3 formation increases with increasing internal energy of SiD+2. Sequential reactions of SiD+3 and Si2D+2 with SiD4 have been previously found to produce terminal species containing five silicon atoms. Si2D+4 reacts with SiD4 only by silicon isotope exchange at 2.0±0.7% of the collision rate (0.20±0.07×10−10 cm3/molecule s ) with no evidence of other reactions (〈0.5% of the collision rate). Reaction of SiD+2 with SiD4 does not lead to unconstrained clustering and particle formation in silane plasmas. High level ab initio calculations on this system are reported by Raghavachari in his companion paper. Energies of the critical intermediates and transition states along the reaction surface are compared quantitatively to the experimental results via phase space calculations. The energies agree to within 6 kcal/mol.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.462834
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