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  • 1980-1984  (1)
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    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 2 (1982), S. 43-59 
    ISSN: 1572-8986
    Keywords: Plasma reactions ; low-pressure rf discharge ; aromatic compounds ; gas chromatography
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A series of aromatic compounds C6H5X (X=CH3, Cl, NO2, NH2, OCH3, CO2CH2CH3, COCH3, CN) were reacted with hydrogen in a 13.6-MHz inductively coupled glow discharge. The flow rates of aromatic and hydrogen were typically 0.5 mmol/min and 18 mmol/min, respectively. The applied power was varied from 50–200 W and the total pressure was varied from 2–14 torr. The products were collected and analyzed by gas chromatography. Three types of reactions were observed: (1) addition of hydrogen to the aromatic, (2) replacement of the group X by hydrogen, and (3) reactions characteristic of aromatic in the absence of hydrogen. The toluene reaction was studied most carefully. Methylcyclohexenes and benzene were the major products identified. The benzene was optimized by increasing the power and decreasing the pressure of either hydrogen or toluene. Reaction of toluene-d8 with hydrogen revealed that hydrogens were sequentially exchanged for deuteria on toluene and each of the products. A new apparatus is described which allows flow rates and pressure to be preselected and controlled and which allows a series of product samples to be collected without quenching the plasma.
    Type of Medium: Electronic Resource
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