ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Traditionally, the chemical composition of surfaces prepared by various chemical, thermal, and plasma oxidation are analyzed by x-ray photoelectron spectroscopy. In this work, both x-ray wide-angle and glancing angle diffraction techniques were used, not only to investigate chemical composition, but also to characterize the structural features of the chemical oxide grown on an InP (100) surface in both HCl and HNO3 etches. These oxides all showed different degrees of preferred orientation with respect to the substrate. In 1M–8M HCl etches, the gradient composition, identified as crystalline hydrous InPO4, was the predominant phase and the rest was mainly composed of hydrous InPO4-based oxides. Coherent hydrated layers, also identified as hydrous InPO4, were obtained in HNO3 etches. In addition, the observation that InI -InIII mixed valence and InI chloro compounds are produced helped clarify the understanding of the dissolution mechanism of InP.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.344479
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