ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Projection imaging with the deep-UV (193 nm) and VUV (157 nm) output of an excimer laser has been applied to submicrometer patterning of thin films by injected-defect, surface-chemical, and solid-transformation processing. The methods have been designed to take advantage of the short-wavelength, high-peak-intensity pulsed radiation from these sources. Examples are described of pattern definition by exposure of multilayer organic resists, by maskless etching and doping of solids in reactive vapors, and by solid-state chemical transformations in inorganic Al/0 films. Well-resolved 0.4-μm lines and spaces have been achieved. Required doses, between 0.04 and 1 J/cm2, are compatible with single- or multi-pulse step-and-repeat projection patterning with a small excimer laser.
Additional Material:
1 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760261614
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