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  • Wiley-Blackwell  (3)
  • 1985-1989  (2)
  • 1965-1969  (1)
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  • 1
    Electronic Resource
    Electronic Resource
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 25 (1985), S. 1026-1034 
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: This review is mainly concerned with the conformational changes that depend on the dielectric constants for solvents for chlorinated polybutadienes (Cl-PBD) and their model compounds. The conformational equilibria of the rotational isomers of both meso and racemie 2,3-dichlorobutanes and 3,4-dichlorohexanes as the model compounds are discussed by analyzing infrared and NMR spectra. The solvent effect on the conformational parameter in Cl-PBD is explained by the variation in the conformation of the chlorinated part having polar C-Cl bonds. The matrix method is also described to calculate the temperature and solvent dependences of conformer populations.
    Additional Material: 17 Ill.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 30 (1985), S. 3385-3395 
    ISSN: 0021-8995
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Plasma polymerizations in five silicon compounds having chemical formula of (CH3)3Si—X—Si(CH3)3, X = none, CH2, NH, O, and S atoms, were investigated by elemental analysis, infrared spectroscopy, and ESCA. The chemical composition of polymers plasma-polymerized was influenced by the X groups in (CH3)3Si—X—Si(CH3)3. Polymers, when X was S atoms, possessed no sulfur; and X was CH2 groups polymers rich in carbon and hydrogen atoms were formed. Details in chemical composition were discussed by IR and ESCA. Such differences in chemical composition reflected on gas permeability of the plasma films.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    New York : Wiley-Blackwell
    Journal of Polymer Science Part B: Polymer Letters 7 (1969), S. 621-623 
    ISSN: 0449-2986
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
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