Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
86 (1999), S. 4262-4266
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Interdiffusion in Fe–Ti, Ag–Bi, Fe–Mo, Ni–Si, Mo–Si, Nb–Si, and Ag–Si multilayers (MLs) was investigated by an in situ low-angle x-ray diffraction technique. Temperature-dependent interdiffusivities were obtained which can be described as Arrhenius relations. The interdiffusion characteristics of the MLs were summarized. The extremely small values of the prefactor D0 and the marked correlation between the D0 and activation energy He for interdiffusion suggest that a collective atomic jumping mechanism involving 8–15 atoms govern the interdiffusion in the MLs. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.371355
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