Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
74 (1999), S. 3041-3043
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Addition of Nd, Tb, or Dy to amorphous Ti–O thin films is found to improve the dielectric properties of the films. Specifically, substitution of 10–30 at. % of the dopant for Ti is found to dramatically decrease the leakage current, increase the breakdown voltage, and yet retain the relatively high dielectric constant ε=50–110 in films 35 nm thick. The high-specific-capacitance a-Ti1−yMyOx films thus produced are suitable for incorporation into future Si integrated circuit technology, e.g., for storage capacitors in semiconductor memory circuits. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.124058
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