ISSN:
1089-7674
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Diamond films were deposited by hot cathode direct current discharge plasma chemical vapor deposition from a CH4–H2 gas mixture. Optical emission spectroscopy was employed to investigate in situ the plasma emission characterization during diamond synthesis. The dependence of plasma emission spectra on the input CH4/H2 ratio and the substrate temperature was investigated. A significant variation in the emission intensity of the CH radical was measured with a change in the CH4 concentration. C2 was detected only at high CH4 concentration. In addition, the relative emission intensity of the C2 species was sensitive to a high substrate temperature. The correlation between the spectra of some species and the quality of diamond films was studied. These results suggest that CH and CH+ are all important precursor species in the diamond deposition reaction, while C2 is associated with the presence of a nondiamond phase in the films. © 1998 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.872812
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