Digitale Medien
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
80 (1996), S. 1437-1445
ISSN:
1089-7550
Quelle:
AIP Digital Archive
Thema:
Physik
Notizen:
In situ high-angle x-ray diffraction (XRD) measurements during an annealing process and extensive low- and high-angle XRD analysis before and after annealing have been performed to study the influence of annealing on the microstructure of a Ni81Fe19/Ag multilayer film. We concentrate on a detailed description and quantification of induced changes in microstructural properties and on changes in the crystalline structure of sublayers. The observed effects obtained from the high-angle XRD, where superlattice structural refinement and standard powder diffraction methods were used, are utilized to model the changes from microscopic point of view. The low-angle XRD reflectivity measurements were analyzed using a new distorted-wave Born approximation approach which enables to get information about interlayer structure parameters such as interface roughnesses, degree of vertical correlation and lateral correlation length. The presented low-angle and high-angle analysis demonstrates general applicability of x-ray diffraction for complex and quantitative in-situ investigation of structural changes in metallic multilayers during annealing. An effect of lateral scaling for different types of roughness is discussed and a general approach is shown for the case of metallic multilayers. © 1996 American Institute of Physics.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1063/1.363011
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