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  • 1
    Electronic Resource
    Electronic Resource
    Buchbesprechungen (1967)
    Springer
    Naturwissenschaften 54 (1967), S. 651-652 
    Details
    ISSN: 1432-1904
    Source: Springer Online Journal Archives 1860-2000
    Topics: Biology , Chemistry and Pharmacology , Natural Sciences in General
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01142438
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  • 2
    Electronic Resource
    Electronic Resource
    Formation of hafnium carbide thin films by plasma enhanced chemical vapor deposition from bis(η-cyclopentadienyl)dimethylhafnium as precursor (1995)
    Springer
    Applied physics 60 (1995), S. 285-288 
    Details
    ISSN: 1432-0630
    Keywords: PACS: 81.15.Gh; 52.90.+z; 68.55.+b
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract. Thin films of hafnium carbide have been deposited by plasma-enhanced chemical vapor deposition using bis(η-cyclopentadienyl)dimethylhafnium, Cp2Hf(CH3)2, as precursor in 13.56 MHz planar reactor. The influence of the various experimental parameters on film properties has been studied. The carbon content ranged from 11 to 40 weight% and increased with the deposition rate. The film hardness varied between 1300 and 2000 HK. Depending on the carbon content and power delivered in the discharge, the film resistivity and film density ranged from 271 to 105 µΩ⋅cm and from 3.4 to 10.4 g/cm3, respectively, and the film composition varied from HfC to hafnium containing a-C:H films.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01538404
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  • 3
    Electronic Resource
    Electronic Resource
    Formation of hafnium carbide thin films by plasma enhanced chemical vapor deposition from bis(η-cyclopentadienyl)dimethylhafnium as precursor (1995)
    Springer
    Applied physics 60 (1995), S. 285-288 
    Details
    ISSN: 1432-0630
    Keywords: 81.15.Gh ; 52.90.+z ; 68.55.+b
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Thin films of hafnium carbide have been deposited by plasma-enhanced chemical vapor deposition using bis(η-cyclopentadienyl)dimethylhafnium, Cp2 Hf(CH3)2, as precursor in 13.56 MHz planar reactor. The influence of the various experimental parameters on film properties has been studied. The carbon content ranged from 11 to 40 weight % and increased with the deposition rate. The film hardness varied between 1300 and 2000 HK. Depending on the carbon content and power delivered in the discharge, the film resistivity and film density ranged from 271 to 105 μΩ·cm and from 3.4 to 10.4 g/cm3, respectively, and the film composition varied from HfC to hafnium containing a-C: H films.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01538404
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  • 4
    Electronic Resource
    Electronic Resource
    Langmuir probe measurements during plasma-activated chemical vapor deposition in the system argon/hydrogen/dicyclopentadienyldimethylhafnium (1995)
    Springer
    Plasma chemistry and plasma processing 15 (1995), S. 371-381 
    Details
    ISSN: 1572-8986
    Keywords: Langmuir probe ; plasma potential ; electron density ; electron energy ; plasma CVD ; rf-discharge
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A Langomir probe investigation of Ar/H2/Cp2HfMe2 plasmas is described. The probe measurements were performed for various discharge conditions. The mean electron energy and electron density were measured for various power, gas flows of argon, and hydrogen and precursor concentrations. Addition of the precursor into the discharge resulted in an appreciable decrease in the electron density and an increase in the mean electron energr. Whereas a transition front the a-mode to the γ-mode has been observed with power rise in the Ar/H2 plasmas without precursor, in the presence of the precursor the plasota α-mode remained unchanged in the power range investigated.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01650735
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  • 5
    Electronic Resource
    Electronic Resource
    Reactions of Nonequilibrium Oxygen Plasmas with Liquid Olefins (1999)
    Springer
    Plasma chemistry and plasma processing 19 (1999), S. 241-254 
    Details
    ISSN: 1572-8986
    Keywords: Oxidation of liquid olefins ; oxygen cold plasmas ; O(3P)
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The oxidation of 13 liquid olefins with either high-voltage or radio frequency (RF) glow discharges has been studied. The reactions were carried out by making the oxygen plasma reach the low vapor pressure substrate. Product formation has proved to be selective—epoxides, aldehydes, ketones, and low quantities of carboxylic acids being the most important species. Fragmentation products were only observed in the traps of the RF system for the most volatile olefin of this study. This indicates that, except for this case, the most relevant interaction of this study has been the heterogeneous reaction of the plasma with the liquid. Total conversion, i.e., mass transformed against initial mass of substrate, has been studied as a function of temperature of the liquid and oxygen flow rate in the reactor, this ranging from 15 to 53.6 mmol/hr in the high-voltage system and 13 to 270 mmol/hr in the RF device. The optimum conversions were 27 to 99%. A correlation between these results and the behavior of the O( 3 P) population in the discharge allows us to conclude that this is the most relevant species to the oxidation process. A discussion relating the structures of the olefins with the composition of the mixtures produced by the oxidation is also presented.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1023/A:1021695726038
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  • 6
    Electronic Resource
    Electronic Resource
    Der Einfluß von60Co-Strahlung auf die dielektrischen Eigenschaften von Polyamiden bei 10 GHz (1969)
    Springer
    Colloid & polymer science 235 (1969), S. 1171-1173 
    Details
    ISSN: 1435-1536
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Summary The dielectric properties of two polyamide-samples (6.- and 6.10-polyamide) are investigated at 10 GHz during and after60Co-γ-radiation (doses ≦ 8 · 108 R) at temperatures between 77 and 360 K. The irradiation caused changes in lattice bond and the decrease in crystallinity was observed by means of the temperature dependences of the relative dielectric constant and of the dielectric loss factor. The glass transition temperatures of both substances are enhanced with increasingγ-dose.
    Notes: Zusammenfassung An zwei Polyamiden (6.- und 6.10-Polyamid) wurden die dielektrischen Eigenschaften bei 10 GHz im Temperaturbereich von 77–360 K bei Bestrahlung mit60Co-Gammastrahlung bis zu einer Dosis von 9 · 108 R bestimmt. Die durch Bestrahlung eintretende Vernetzung und die Zerstörung der Kristallinität konnten aus der Temperaturabhängigkeit von relativer Dielektrizitätszahl und dielektrischem Verlustfaktor abgelesen werden. Die Glasübergangstemperaturen der beiden Stoffe vergrößerten sich mit wachsender Gammadosis.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01542523
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  • 7
    Electronic Resource
    Electronic Resource
    Einfluß von γ-Strahlung auf dielektrische und mechanische Eigenschaften von Polymethylmethacrylat und Polypropylen (1968)
    Springer
    Colloid & polymer science 225 (1968), S. 121-124 
    Details
    ISSN: 1435-1536
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Summary The dielectric and mechanical loss factors and the dielectric constant of two high-polymers (polypropylene and polymethylmethacrylate) were investigated after γ-irradiation (maximum dose 5·107 R). The measurements were done in the frequency range between 50 c/s and 104 c/s and in the temperature range between 20 °C and 140 °C. For polypropylene the loss factor was enlarged and a shift of the dielectric loss factor maximum to higher temperatures was observed. The half-width of the dielectric loss factor of PMMA increased slightly due to γ-irradiation.
    Notes: Zusammenfassung Die dielektrischen und mechanischen Verlustfaktoren und die Dielektrizitätszahl wurden an zwei Hochpolymeren (Polypropylen und Polymethylmethacrylat) unter Einfluß von γ-Strahlung (maximale Dosis 5·107R) bei Frequenzen zwischen 50 und 104 Hz gemessen. Es zeigte sich eine sehr starke Vergrößerung der Verluste bei Polypropylen im Bereich der Meßtemperatur zwischen 20 und 140°C. Weiterhin konnte eine leichte Verschiebung des Verlustfaktordispersionsbereiches zu höheren Temperaturen beobachtet werden. Die untersuchten dielektrischen und mechanischen Eigenschaften von PMMA änderten sich demgegenüber nur sehr wenig. Es wurde jedoch eine leichte Vergrößerung der Halbwertsbreite des Verlustfaktordispersionsgebietes mit steigender γ-Dosis festgestellt.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF02086185
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  • 8
    Electronic Resource
    Electronic Resource
    Nucleophilie und Basizität von Aminen (1965)
    Weinheim : Wiley-Blackwell
    Zeitschrift für die chemische Industrie 77 (1965), S. 739-739 
    Details
    ISSN: 0044-8249
    Keywords: Chemistry ; General Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/ange.19650771669
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  • 9
    Electronic Resource
    Electronic Resource
    Organische Synthesen im Plasma von Hochspannungsentladungen (1968)
    Weinheim : Wiley-Blackwell
    Zeitschrift für die chemische Industrie 80 (1968), S. 202-203 
    Details
    ISSN: 0044-8249
    Keywords: Chemistry ; General Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/ange.19680800528
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  • 10
    Electronic Resource
    Electronic Resource
    In situ microscopy for on-line characterization of cell-populations in bioreactors, including cell-concentration measurements by depth from focus (1995)
    New York, NY [u.a.] : Wiley-Blackwell
    Biotechnology and Bioengineering 47 (1995), S. 106-116 
    Details
    ISSN: 0006-3592
    Keywords: in situ microscopy ; on-line biomass determination ; cell concentration ; depth from focus ; image analysis ; Chemistry ; Biochemistry and Biotechnology
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Biology , Process Engineering, Biotechnology, Nutrition Technology
    Notes: A new technique is presented which allows the use of a front-end sensor head for in situ and on-line characterization of cell concentration and cell size during fermentation. An epifluorescence microscope is mounted in a port of a bioreactor viewing directly into the agitated broth. Still images from cells are generated using pulsed illumination. They are directly visualized on a monitor and used for automatic image analysis. The cell concentration and morphological information are determined by counting and evaluating the cell images with respect to their depth from focus characteristic. An in situ microscope was successfully tested during yeast fermentations and yielded results which correlated well with results from a hemocytometer. © 1995 John Wiley & Sons, Inc.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/bit.260470113
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