ISSN:
1573-4846
Keywords:
sol-gel method
;
photoirradiation
;
anti-reflection/anti-static film
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
Notes:
Abstract A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1023/A:1018306428922
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