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  • 2010-2014  (58)
  • 2000-2004  (79)
  • 1995-1999  (53)
  • 1990-1994  (23)
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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 64 (1993), S. 1699-1704 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Two different electron density reconstruction methods for 8-keV neutral lithium beam probing have been developed for the Compact Helical System (CHS). Density dependences on emission and ionization processes are included by using effective rate coefficients obtained from the collisional radiative model. Since the two methods differ in the way the local beam density in the plasma is determined, the methods have different applicable electron densities. The beam attenuation is calculated by iteration from the electron density profile in method I. In method II, the beam remainder at the observation point z is determined by integrating the Li i emission intensity from z toward the position of emission tail-off. At the emission tail-off, the fast lithium beam is completely attenuated. Selecting an appropriate method enables us to obtain edge electron density profile well inside the last closed flux surface for various ranges of plasma densities (1012–5×1013 cm−3). The electron density profiles reconstructed by these two different methods are in good agreement with each other and are consistent with results from ruby laser Thomson scattering.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 64 (1993), S. 2737-2745 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A plasma source based on an inductive breakdown of a supersonic gas puff is described. The source was developed to provide an anode plasma for an annular, extraction geometry, magnetically insulated ion diode. In this source, plasmas with densities of 1013 cm−3 were generated and accelerated to velocities of 20–30 cm/μs; plasma fluxes of 10–40 A/cm2 were obtained. Operating the source under the diode insulating field effect, plasma fluxes above 100 A/cm2 were observed. When the plasma source was used in conjunction with a magnetically insulated diode gap, intense ion beams with proton fluxes of more than 100 A/cm2, energies of 100 keV, and beam pulses longer than 1 μs were extracted.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 4821-4824 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A dc glow discharge source with controlled plasma potential was developed for application in plasma immersion ion implantation processing of materials surfaces. This type of ion implantation system allows cost effective surface modification of workpieces with complex shapes. The effects of the nitrogen plasma etching during the plasma immersion ion implantation process was studied using Si wafers as monitors, as we varied the externally controlled plasma potential between 0 and 350 V. When the plasma potential is controlled below 70 V, the ion implantation is dominant, otherwise the etching overtakes. The nitrogen implanted silicon wafers were analyzed by high resolution x-ray diffraction and Auger electron spectroscopy which revealed successful implantation of ions with accumulated nitrogen dose of 1.5×1017 cm−2, for the low potential case. © 1999 American Institute of Physics.
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  • 4
    Electronic Resource
    Electronic Resource
    Oxford, UK : Blackwell Publishing Ltd
    Annals of the New York Academy of Sciences 707 (1993), S. 0 
    ISSN: 1749-6632
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Natural Sciences in General
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Springer
    Journal of applied electrochemistry 25 (1995), S. 817-822 
    ISSN: 1572-8838
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Electrical Engineering, Measurement and Control Technology
    Notes: Abstract A new type of PbO2-coated metal anode, useful for electrochemical processing requiring the use of high-overpotential anodes, was prepared by applying to a titanium substrate an undercoating of Ti-Ta oxides, then covering the undercoating with an intermediate coating of stress-free α-PbO2 deposit, and finally covering the intermediate coating with a Ta2O5 particle-admixed β-PbO2 deposit. The anode thus produced was found to be superior to the anodized Pb or platinized Ti anode in respect of oxygen overvoltage, and corrosion resistance, even in solutions containing organic solvents. The possibility for use in chromium plating is also indicated.
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  • 6
    Electronic Resource
    Electronic Resource
    Springer
    Journal of applied electrochemistry 25 (1995), S. 817-822 
    ISSN: 1572-8838
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Electrical Engineering, Measurement and Control Technology
    Notes: Abstract A new type of PbO2-coated metal anode, useful for electrochemical processing requiring the use of high-overpotential anodes, was prepared by applying to a titanium substrate an undercoating of Ti-Ta oxides, then covering the undercoating with an intermediate coating of stress-free α-PbO2 deposit, and finally covering the intermediate coating with a Ta2O5 particle-admixed β-PbO2 deposit. The anode thus produced was found to be superior to the anodized Pb or platinized Ti anode in respect of oxygen overvoltage, and corrosion resistance, even in solutions containing organic solvents. The possibility for use in chromium plating is also indicated.
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  • 7
    Electronic Resource
    Electronic Resource
    Springer
    Astrophysics and space science 256 (1997), S. 533-538 
    ISSN: 1572-946X
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract The design and construction of a compact high-voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma immersion ion implantation (PIII) are described. The generator was built on a circuit category of Pulse Forming Network (PFN), consisting of nine LC sections with L = 270 μH and C = 2.5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 μs pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with sine-wave, constant current source, and a 60 kV, 15 mA switching power supply.
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  • 8
    Electronic Resource
    Electronic Resource
    Springer
    Archive of applied mechanics 64 (1994), S. 295-306 
    ISSN: 1432-0681
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Übersicht Die Lösung des zweiten gemischten Randwertproblems der ebenen Elastizität mit zwei kraftbeanspruchten und zwei gestützten Rändern wird dargestellt. Für die Analyse wird eine rationale Abbildung verwendet, die als Summe partieller Lösungen aus komplexen Spannungsfunktionen aufgebaut ist. Für gleichmäßige Zug- und Schubbeanspruchungen kann die Lösung in geschlossener Form dargestellt werden und ist verwendbar in Rißaufgaben der linear elastischen Bruchmechanik. Als Illustration der allgemeinen Lösung dient ein verzweigter Bereich der gegenseitigen Einwirkung einer quadratischen Öffnung mit Seitenkerbe und eines Risses. Die Spannungsverteilungen und Spannungsintensitäten werden dabei berechnet.
    Notes: Summary A solution is obtained for the second mixed boundary value problem with two boundaries loaded with external forces, and the other two boundaries simply supported. A rational mapping function formed as a sum of fractional expressions and complex stress functions is used for the analysis. A closed form solution can be obtained under uniform tensile and shearing loadings. These solutions are applicable to crack problems in linear elastic fracture mechanics. In order to illustrate the general solution, a double connected region is considered, in which interaction between a square hole with a crack extension and another crack is investigated. Stress distributions and stress intensity factors are obtained.
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  • 9
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 426-432 (Aug. 2003), p. 1175-1180 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 426-432 (Aug. 2003), p. 1801-1806 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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