Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
65 (1994), S. 3019-3021
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A new technique is required which enables tailoring of the morphology of a metallic nanostructured material down to the 10 nm length scale. Using nanoporous nuclear track etched membranes as templates for electrodeposition, an assembly of wires with diameters as low as 30 nm could be obtained. Alternating the electrodeposition of two metals resulted in multilayers grown perpendicular to the wire axis. Layer thicknesses as low as 2 nm could be reached. Application is demonstrated by making wires 6 μm long, 80 nm in diameter, having a succession of either Co and Cu layers or of (Ni,Fe) and Cu layers. Wires containing layers of 5–10 nm in thickness exhibited a giant magnetoresistance. The current was naturally perpendicular to the layers. At ambient temperature, a magnetoresistance of 14% for Co/Cu and of 10% for (Fe,Ni)/Cu was observed. © 1994 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.112495
Permalink
|
Location |
Call Number |
Expected |
Availability |
