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  • American Institute of Physics (AIP)  (2)
  • Blackwell Publishing Ltd  (1)
  • 1990-1994  (3)
  • 1985-1989
  • 1992  (3)
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  • 1990-1994  (3)
  • 1985-1989
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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 4739-4742 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A nongraphical approach is proposed for measuring and evaluating the ideality n factor and the series resistance of a Schottky diode. The approach involves the use of an auxiliary function and a computer-fitting routine. This technique has been found to be both accurate and reliable. The validity of this has also been confirmed by way of I-V measurements using both commercially available and laboratory-prepared Schottky diodes.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: High-density plasmas are being used in the manufacture of electronic devices and systems because they provide high throughput at low pressure and low ion energy. Low pressure is desirable for maximizing process uniformity over large substrates while low ion energy is desirable for minimizing process-induced damage. However, the optimal design for a high density plasma reactor is unclear and the technology has largely developed empirically: many alternatives for magnetic and geometric design are offered for the same processing applications. In this talk we discuss diagnostic measurements of high density plasma reactors and how they can be used in developing improved reactor designs and in providing insight into materials processing. Laser-induced fluorescence measurements of metastable ion velocity distributions are made in both Ar and Cl2 electron cyclotron resonance and helicon plasmas. The effects of magnetic field configuration, power, and pressure on the energy and angular distributions of the ions will be described along with electron density measurements made by microwave interferometry. Where appropriate, comparisons will be made with the recent theoretical results of Graves and Porteous [D. B. Graves and R. K. Porteous, American Vacuum Society National Symposium, Seattle, WA, November (1991)].
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Oxford, UK : Blackwell Publishing Ltd
    Plant pathology 41 (1992), S. 0 
    ISSN: 1365-3059
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Agriculture, Forestry, Horticulture, Fishery, Domestic Science, Nutrition
    Notes: The pathogenicity of Phytophthora cambivora to Mission almond seedlings was confirmed by twig inoculation in situ. An excised twig assay using four isolates of P. cambivora showed almond cvs Mission and Chellaston to be susceptible, whereas peach cv. Nemaguard, which is commonly used as a rootstock for almond, was resistant. P. cambivora isolates 179 and 108, the most and least aggressive, respectively, were selected for further studies. The excised twig assay was modified for screening micropropagated shoots in vitro for response to P. cambivora. Defoliated shoots were placed upright in agar medium colonized with the fungus, and development of necrosis was assessed over a period of 2-3 days. Shoots of Chellaston developed extensive necrosis and those of Nemaguard developed little necrosis, whereas shoots of hybrid selections from peach x almond crosses were generally intermediate in response. This method permits rapid and efficient screening of large amounts of material, and would be a useful adjunct to conventional almond breeding programmes.
    Type of Medium: Electronic Resource
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