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  • 1990-1994  (3)
  • 1990  (3)
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  • 1990-1994  (3)
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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Journal of materials science 1 (1990), S. 133-136 
    ISSN: 1573-482X
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract A 60 nm GaAs/AIAs superlattice has been annealed under a variety of conditions. In the case of samples annealed in an arsenic rich atmosphere, the disordering of the superlattice was observed to be non-uniform. This non-uniformity of the disordering is in contrast to the observed disordering of the sample annealed under arsenic dissociative pressure. In this case the disordering of the superlattice was uniform throughout the sample. Until now evidence for the depth dependency of the interdiffusion process relied solely on the interpretation of photoluminescence results. The data obtained from these experiments clearly indicate that the interdiffusion of GaAs/AIAs superlattices cannot be represented by one interdiffusion coefficient, as proposed by Tan and Gosele. In addition, it is demonstrated that the interdiffusion coefficient presented by Tan and Gosele overestimates the true interdiffusion coefficient at 1000° C.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    International Journal of Numerical Modelling: Electronic Networks, Devices and Fields 3 (1990), S. 91-97 
    ISSN: 0894-3370
    Keywords: Engineering ; Electrical and Electronics Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Electrical Engineering, Measurement and Control Technology
    Notes: The diffusion of Zn into a GaAs crystal is modelled using numerical techniques similar to those of Zahari and Tuck.1 This technique does not directly solve any differential equations, the physical processes are directly modelled. The diffusion of Zn is assumed to be by the kick-out mechanism. In this mechanism the Zn atoms diffuse into the crystal interstitially with a constant diffusion coefficient. The interstitial Zn atoms transfer to the substitutional lattice site by kicking out a Ga atom. The incorporation of the Zn atoms on to the lattice sites is assumed to take place at a rate much greater than the diffusion of the interstitial Zn. The diffusion of the generated Ga interstitial is also contained in the model. The effect on the Zn concentration profile and Ga interstitial concentration of varying both the Ga interstitial diffusivity and equilibrium concentration has been examined. Finally, the implications of these results on Zn induced disordering of GaAs/AlAs superlattices is discussed.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Publication Date: 1990-06-01
    Print ISSN: 0268-1242
    Electronic ISSN: 1361-6641
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Published by Institute of Physics
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