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  • Physics  (133)
  • Chemical Engineering  (122)
  • Inorganic Chemistry
  • 1980-1984  (316)
  • 1983  (316)
  • 1
    Electronic Resource
    Electronic Resource
    Vapor-pressure osmometry and inverse gas chromatography in the analysis of thermodynamic properties of polymer solutions (1983)
    New York : Wiley-Blackwell
    Journal of Polymer Science: Polymer Physics Edition 21 (1983), S. 859-868 
    Details
    ISSN: 0098-1273
    Keywords: Physics ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Notes: The primary objective of this work is to check the utility of vapor-pressure osmometry as an experimental technique in obtaining thermodynamic data on polymer/solvent systems. The second objective is to obtain experimental values for the exchange energy parameters ΔP, X, and ζ of the theory of Sanchez and Lacombe. With respect to the first objective, solvent activities of polyiso-butylene/benzene mixtures have been measured at several concentrations up to 600 g/kg of the solvent and at two temperatures. From the activities, it is possible to determine free energies, entropies, and enthalpies and their concentration dependence. Satisfactory agreement has been found between the results obtained and data provided by other techniques such as membrane osmometry and the Cahn electrobalance. These and other data obtained by inverse gas chromatography for the same mixture in the range 35-200°C have been used in calculating the exchange energy parameter of the lattice fluid theory at different concentrations and temperatures.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pol.1983.180210603
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  • 2
    Electronic Resource
    Electronic Resource
    Letters to the editor (1983)
    Hoboken, NJ : Wiley-Blackwell
    AIChE Journal 29 (1983), S. 172-173 
    Details
    ISSN: 0001-1541
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/aic.690290130
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  • 3
    Electronic Resource
    Electronic Resource
    Letters to the editor (1983)
    Hoboken, NJ : Wiley-Blackwell
    AIChE Journal 29 (1983), S. 525-526 
    Details
    ISSN: 0001-1541
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/aic.690290332
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  • 4
    Electronic Resource
    Electronic Resource
    Poly(4-chlorostyrene), a new high contrast negative E-beam resist (1983)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 23 (1983), S. 1047-1049 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: PCS(poly-4-chlorostyrene) has previously been evaluated as a negative e-beam resist, but although the sensitivity was good [2 to 5μC/square centimeter (cm2)], the contrast (γ) was poor (1.1 to 1.5). Recent experiments have shown that contrast is not only a function of molecular weight distribution (MWD), but can also be affected by polymerization conditios. Among these are: branching, head to head linkages, and oxygen in backbone. PCS was prepared via thermal free radical solution polymerization, and then fractionated by differential solvation techniques. Reactions occurring during polymerization and crosslink formation on irradiation will be discussed. For molecular weights of 700 and 300K respectively (same MWD), the sensitivity was 2 and 5μC/cm2, while the contrast (γ) was 3.5 for both. This is the highest reported contrast for a polymeric negative resist. The resist can then be UV hardened after development, and will not flow at 200°C. The RIE etch rate is ∼1/2 that of PMMA in various plasmas.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760231814
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  • 5
    Electronic Resource
    Electronic Resource
    Organosilicon polymers for lithographic applications (1983)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 23 (1983), S. 1054-1058 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Linear polymers of silicone gums (polysiloxanes) have many attributes that make them attractive for lithographic applications, such as oxidative and thermal stability, good adhesion properties, solubility in common solvents, and resistance to etching in an oxygen plasma. When polysiloxanes are used as the top imaging layer (∼2000Å) in a two-layer resist system, the developed negative siloxane images act as a high resolution etch mask for the oxygen plasma etching of the bottom planarizing polymer layer. Commercially available polysiloxanes have been evaluated for their deep UV sensitivity at 2537Å, and have been found to have very high resolution capabilities (∼0.5μ) and high contrast (γ = 4). The negative images do not swell in the developer, and the line width is therefore independent of development time. The combination of high resolution, sensitivity, and ease of processing make this a simple multilayer system for deep UV and e-beam applications.
    Additional Material: 11 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760231816
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  • 6
    Electronic Resource
    Electronic Resource
    Profile modification of resist patterns in optical lithography (1983)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 23 (1983), S. 925-930 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: A method is described to modify profiles of resist patterns in novolac and diazo-oxide containing systems. After patterning of the resist, two successive uniform flood exposures are given, one with deep UV (254 nm) at water-free conditions and the next with near UV (λ 〉 300 nm) at normal atmospheric conditions. The profile which results after development is vertical, concave or overhanging depending on flood exposure conditions and development processing. As the method includes a flood near UV exposure at atmospheric conditions the imagewise exposure energy can be reduced to approximately 35 percent of the normal value. Furthermore it gives also the possibility of using the resist as a deep UV resist. Another important implication is that standing wave effects are completely eliminated.
    Additional Material: 9 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760231702
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  • 7
    Electronic Resource
    Electronic Resource
    Use of NMR triad data for the determination of reactivity ratios (1983)
    New York : Wiley-Blackwell
    Journal of Polymer Science: Polymer Chemistry Edition 21 (1983), S. 917-920 
    Details
    ISSN: 0360-6376
    Keywords: Physics ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pol.1983.170210325
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  • 8
    Electronic Resource
    Electronic Resource
    Characterization of poly(D,L-lactic acid) by gel permeation chromatography (1983)
    New York : Wiley-Blackwell
    Journal of Polymer Science: Polymer Chemistry Edition 21 (1983), S. 197-208 
    Details
    ISSN: 0360-6376
    Keywords: Physics ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: A number of samples of poly(D,L-lactic acid) (PLA) with weight-average molecular weights M̄w in the range 15,000-350,000 were prepared by a ring-opening polymerization. The molecular weight distributions (MWDs) of these samples were determined by gel permeation chromatography (GPC). The method involves a universal calibration of the columns on the basis of polystyrene standards and a rapid iteration algorithm leading to the establishment of the Mark-Houwink relationship. In addition, osmometry and viscometry data are presented. The effect of hydrolytic degradation on the MWD of two PLA samples was studied by GPC.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pol.1983.170210121
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  • 9
    Electronic Resource
    Electronic Resource
    1H-NMR study of structure and tacticity in p-t-butylstyrene/methyl methacrylate copolymers (1983)
    New York : Wiley-Blackwell
    Journal of Polymer Science: Polymer Chemistry Edition 21 (1983), S. 1773-1783 
    Details
    ISSN: 0360-6376
    Keywords: Physics ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: Copolymers prepared by the bulk copolymerization of p-t-butylstyrene (S) and methyl methacrylate (M) were analyzed by 1H-NMR. The spectra showed fine structure in the δ 2.2-3.6 region similar to that reported for styrene/methyl methacrylate copolymers. Reactivity ratios for S-M copolymers determined by classical composition measurements differed markedly from the same ratios determined by NMR when it was assumed that NMR peak-triad assignments could be made by analogy with published styrene/methyl methacrylate assignments. A new set of peak-triad assignments was proposed that reconciles this difficulty and gives good agreement between triad fractions measured by NMR and those calculated from theory.
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pol.1983.170210619
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  • 10
    Electronic Resource
    Electronic Resource
    A reassessment of the 1H-NMR spectra of styrene/methyl methacrylate copolymers (1983)
    New York : Wiley-Blackwell
    Journal of Polymer Science: Polymer Chemistry Edition 21 (1983), S. 2427-2438 
    Details
    ISSN: 0360-6376
    Keywords: Physics ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: The methoxy 1H-NMR assignments in the 2.1-3.7δ region for styrene/methyl methacrylate copolymers have been assessed in terms of pentad sensitivity. Several of the methoxy resonances suggested by this study differ from literature assignments. The evidence in support of these reasignments is based on a comparison of calculated and observed triad distributions and on the good agreement of the value of the reactivity ratio rM calculated from individual triads with that obtained by classical methods. A new procedure for the determination of the tacticity coefficient σ is applied.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pol.1983.170210825
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