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  • Other Sources  (1)
  • FABRICATION TECHNOLOGY  (1)
  • 1980-1984  (1)
  • 1981  (1)
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    Automatic chemical vapor deposition (1981)
    In:  Other Sources
    Details
    Publication Date: 2019-06-28
    Description: Report reviews chemical vapor deposition (CVD) for processing integrated circuits and describes fully automatic machine for CVD. CVD proceeds at relatively low temperature, allows wide choice of film compositions (including graded or abruptly changing compositions), and deposits uniform films of controllable thickness at fairly high growth rate. Report gives overview of hardware, reactants, and temperature ranges used with CVD machine.
    Keywords: FABRICATION TECHNOLOGY
    Type: MFS-25249 , NASA Tech Briefs (ISSN 0145-319X); 5; 3; P. 393
    Format: text
    Location Call Number Expected Availability
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    NASA TECHNICAL REPORTS
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