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Digitale Medien

Apparent super resolution in high-contrast photoresists (1992)

Peckerar, Martin ; Rebbert, Milton ; Gopalakrishnan, Ganesh

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 61 (1992), S. 2036-2038

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Details

ISSN: 1077-3118

Quelle: AIP Digital Archive

Thema: Physik

Notizen: Optoelectronic modulators and couplers frequently require high-aspect ratio feature definition in thick (≥10 μm) gold. The common process used involves up plating with a photoresist guide. Theory argues that feature boundaries would be degraded due to both diffractive spreading and scattering of the incident light in the resist. This is not observed and near-90° sidewalls appear obtainable. This letter demonstrates this effect and proposes an explanation for it.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1063/1.108351

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