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    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 71 (2000), S. 3313-3316 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: For the generation of a well defined prepulse in high intensity laser plasma interactions, we implemented a newly developed prepulse device into a multiterawatt titanium:sapphire amplifier system. The temporal delay between the prepulse and main pulse is variable between −350 ps and + 100 ps. If the laser pulse is focused on a target, the spatial overlap of the two pulses in the focal point is corrected automatically over the entire range. It is possible to attenuate the main pulse as well as the prepulse independently of each other by more than one order of magnitude. We investigated the dependence of the Kα emission of the laser produced plasma of a silicon target on the delay between the prepulse and main pulse. An increase of the yield of the Kα emission by a factor of 2 for a temporal delay of several tens of picoseconds between the prepulse and main pulse was measured. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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