ISSN:
1436-5073
Keywords:
thin film deposition
;
magnetron sputtering
;
hard coatings
;
boron nitride
;
electron microscopy
;
electron energy loss spectroscopy
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
Notes:
Abstract A series of BN films was deposited by means of r.f. magnetron sputtering of a h-BN target onto Si(1OO) surfaces. Hereby, the substrate bias voltage was varied. Special interest is focussed to the influence of the deposition parameters on the orientation of the growing hexagonal BN film with respect to the substrate. For structural investigation, cross section samples were prepared. In addition to HRTEM and diffraction investigations, especially electron energy loss spectroscopy (EELS) was applied successfully for phase identification. For negative bias voltages of U B =−300 V and U B =−350V, we found a phase system consisting of a first-grown 25 nm thick layer of hexagonal structure with the c axis parallel to the substrate surface followed by the cubic phase.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01246198
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