ISSN:
1089-7690
Source:
AIP Digital Archive
Topics:
Physics
,
Chemistry and Pharmacology
Notes:
Thermal electron attachment to NO2 in He, Ar, Xe, N2, CO2, and n-C4H10 has been studied at pressures from about 100 Torr to near one atmosphere. With the increase of buffer-gas pressures the effective two-body attachment rate constants tend to increase gradually from the value of 1.1×10−10 cm3 molecule−1 s−1 obtained in the previous study as the initial two-body attachment rate constant (k1) of the two-step three-body process; the only exception is He, for which no such increase of the rate constant has been observed. These results suggest that in all the buffer gases except for He the electron attachment to van der Waals molecule (NO2⋅M), where M is a buffer-gas molecule, appears at higher pressures. But for He as the buffer gas such a mechanism is negligible in the pressure range employed here, because the equilibrium constant for the complex formation is very small in this case. The rate constants for the electron attachment to van der Waals molecules are about two orders of magnitudes larger than the value of k1 and have no appreciable correlation with the nature of buffer gases.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.451244
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