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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 259-266 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effects of background n- and p-type doping on Zn diffusion in GaAs/AlGaAs multilayered structures are investigated by secondary-ion-mass spectrometry and photoluminescence measurements. Zn diffusions are performed at 575 °C into Si-doped, Be-doped, and Si/Be-codoped identical GaAs/Al0.2Ga0.8As multiple-quantum-well structures. The results obtained by secondary-ion-mass spectrometry show that the Zn diffusion induces an enhancement of Be out-diffusion and the disordering of all structures. The effective Zn diffusivity and the disordering rate are increased by Be doping and reduced by Si doping. Photoluminescence measurements give information about the reactions of different point defects during the diffusion process. Before Zn diffusion, the Si-doped structures contain a high concentration of column-III vacancies, whereas As vacancies are the dominant defects in the Be-doped structures. After Zn diffusion, we observe a reduction of column-III vacancy concentration in Si-doped structures and an increase of column-III interstitial concentration in Be-doped structures. A model based on the "kick-out" mechanism of Zn diffusion is proposed to explain our observations. The supersaturation of column-III interstitials behind the Zn diffusion front is responsible for the enhancements of Al–Ga interdiffusion and Be out-diffusion. The effective Zn diffusivity is controlled by the background donor or acceptor concentration ahead of the Zn diffusion front and by the concentration of column-III interstitials behind the Zn diffusion front. For Be-doped structures, the increase in the background acceptor concentration and the supersaturation of column-III interstitials in the Zn-diffused region results in an enhancement of the Zn diffusivity. For Si-doped structures, the effective Zn diffusivity decreases with increasing background donor concentration. Moreover, the concentrations of column-III interstitials and column-III vacancies in the Zn-diffused region are reduced due to their mutual annihilation, leading to a retardation of Zn diffusion. © 1999 American Institute of Physics.
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  • 2
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The mechanism of silicon diffusion in GaAs, Al0.3Ga0.7As, and the silicon diffusion-induced layer disordering of multiquantum wells have been studied by photoluminescence, secondary-ion-mass spectroscopy, and transmission electron microscopy across a corner of a wedge-shaped sample. The diffusion source was a grown in highly Si-doped layer. The main photoluminescence properties of point defects in GaAs and Al0.3Ga0.7As are reviewed to interpret the experimental data. The depth profile of the photoluminescence allows the spatial correlation between the luminescence spectra and the Si concentration profile obtained from secondary-ion-mass-spectroscopy measurements. On the basis of the photoluminescence results, the physical processes occurring during the Si diffusion are discussed. Frenkel defects (pairs of element-III vacancies and interstitials) are generated in the highly Si-doped region. The element-III interstitials rapidly diffuse towards the surface where they react with the element-III vacancies generated at the surface when annealing is performed in an external As pressure. This induces a supersaturation of element-III vacancies in the Si-doped region which drives the Si diffusion. Annealing in vacuum reduces the oversaturation of element-III vacancies and, hence, reduces the Si diffusion. A domination of the Si donor–element-III vacancy complex emission band was found in the spectra taken in the Si-diffused region. This gives evidence for the vacancy-assisted mechanism in the Si diffusion and in the impurity-induced disordering.
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  • 3
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: GaAs/AlxGa1−xAs multiple-quantum-well (MQW) structures with identical well thicknesses but with different Al contents x in the barrier (x≈0.1, 0.2, 0.45, and 1) were grown by molecular-beam epitaxy to study the impurity-induced disordering mechanism. The disordering of the structures is observed directly by transmission electron microscopy on cleaved wedges of the sample, by the secondary electron imaging mode of scanning electron microscopy, and by secondary-ion-mass spectroscopy after Zn diffusions at 575 °C during different times (1, 4, 9, and 16 h). The results show that the totally and partially disordered regions are always behind the Zn diffusion front. The partially disordered extent depends on x. As x increases, the disordering rate increases due to the increase in Zn diffusivity. The effect of high Zn concentration is investigated by photoluminescence and by Raman scattering measurements. The systematical analysis of the photoluminescence spectra of the MQW structures diffused for different times and of the photoluminescence spectra taken on different depths below the sample surface makes it possible to describe the physical processes occurring during Zn diffusion. The column-III vacancies are created at the sample surface. They diffuse into the bulk of the sample where they are filled by other defects. Using the x-ray-diffraction technique, an expansion of the lattice constant in the region behind the Zn diffusion front was observed. This is due to a supersaturation of column-III interstitials. During the incorporation of Zn into the crystal lattice, column-III interstitials are generated. These interstitials could be responsible for the enhancement of the Al-Ga interdiffusion. The important role of the electric field at the p-n junction formed by Zn diffusion is discussed. The negatively charged column-III vacancies and the positively charged column-III interstitials are confined, respectively, on the n and p sides of the p-n junction. The results give evidence for the self-interstitial mechanism of Zn diffusion-induced disordering in GaAs/AlGaAs MQW structures.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 3887-3891 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Annealing in excess arsenic vapor at 650 °C introduces thermal conversion of n-type Si-doped GaAs samples (n = 1.3 × 1018 cm−3) into p type. The observations are made by current-voltage and electron-beam induced current measurements. The donor concentration on the n side near the junction decreases after annealing. We present a comparison between the photoluminescence spectra of samples annealed under different conditions and an analysis of depth profile of the photoluminescence spectra. Our results underline the important role of gallium vacancies and gallium vacancy-silicon donor complex in the thermal conversion.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 5493-5500 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: After Zn diffusion into Si-doped GaAs (n≈1.5×1018 cm−3), the Zn-diffused samples are annealed under different conditions: (i) in vacuum, (ii) in arsenic vapor, and (iii) with a Si3N4 mask capping the sample surface. The Zn concentration profiles obtained by secondary-ion-mass spectroscopy and the photoluminescence (PL) spectra taken at different depths below the sample surface are studied in detail. After annealing in vacuum, the steep (p+-n) Zn diffusion front advances into the bulk. We observe that the intensity ratio between the Si donor-gallium vacancy complex (SiGa-VGa) related emission band and the band-to-band (e-h) transition is enhanced in the region ahead of the Zn diffusion front. In contrast, Zn atoms diffuse deeper into the bulk of the samples annealed in arsenic vapor with or without capping layer. These samples show the kink-and-tail (p+-p-n) Zn concentration profiles with a decrease in the intensity ratio around the tail region. The analysis of the PL data suggest a supersaturation of gallium vacancies ahead of the diffusion front of the sample annealed in vacuum and an undersaturation of this defect around the tail region of the samples annealed in As vapor. Our results underline the important role of the nonequilibrium of the defect concentration during the postdiffusion annealing, which permits explanation of the anomalous double profile of Zn by the interstitial-substitutional mechanism.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 7585-7593 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: To study the mechanism of zinc diffusion in GaAs, we diffused zinc from a ZnAs2 source into Si-doped GaAs samples (n ≈ 1.3 × 1018 cm−3) at different temperatures (from 575 °C up to 700 °C) in sealed evacuated quartz tubes. The samples are characterized by the depth profile of the photoluminescence at different temperatures. The photoluminescence spectra show characteristic emission associated to deep levels of gallium and arsenic vacancies. A detailed analysis of the spectra demonstrates the role played by vacancies in the Zn diffusion process. The spatial correlation between the luminescence spectra and the Zn concentration obtained from secondary ion mass spectroscopy measurements has been demonstrated.
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 718-724 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Strong evidence for amphoteric native defect reactions is obtained by photoluminescence analysis of Si-doped GaAs samples (n(approximate)1.5×1018 cm−3) annealed under different conditions. Annealing in excess As4 vapor creates a large concentration of Ga vacancies, making possible the transformation of this defect into an As vacancy and an As antisite defect. Similarly, As vacancies generated at high concentration during annealing under Ga-rich conditions are transformed into Ga vacancies and Ga antisite defects. Photoluminescence intensities associated with the corresponding defects are in qualitative agreement with the predictions of the mass action law applied to the amphoteric native defect reactions. © 1998 American Institute of Physics.
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 74 (1999), S. 516-518 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Radial distributions of axial stress across B/Ge- and Sn/Ge-codoped core fibers and a Corning standard single-mode fiber were measured before and after hydrogen loading under different conditions. A significant reduction of axial stress in the core of all investigated fibers is observed after hydrogen loading. The stress reduction in the core of hydrogen-loaded fibers is irreversible and depends strongly on the core dopants and the fiber drawing tension. The hydrogen-induced core stress reduction is believed to be related to the reactions between hydrogen and drawing-induced defects in the fiber core. © 1999 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 143-147 (Oct. 1993), p. 1397-1402 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
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  • 10
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 196-201 (Nov. 1995), p. 1643-1648 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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