Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
74 (1993), S. 6990-6992
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Erbium doped GaAs was grown by metal-organic chemical vapor deposition using a novel liquid precursor: tris(n-butylcyclopentadienyl)erbium [Er(C4H9C5H4)3]. The morphology was excellent at growth temperatures near 620 °C. Based on a simple model for the excitation dependence of the emission, the nonradiative Auger-type process was estimated to be nearly five times that of the energy transfer process from bound excitons to the Er3+ ions that subsequently resulted in the Er-related light emission. Temperature induced quenching of the emission was found to be dominated by transitions with an activation energy of 74 meV.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.355052
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